Track etching parameters for plastics

1970 ◽  
Vol 3 (2) ◽  
pp. 267-270 ◽  
Author(s):  
G. E. Blanford ◽  
R. M. Walker ◽  
J. P. Wefel
2012 ◽  
Vol 217-219 ◽  
pp. 2183-2186
Author(s):  
Chao Wei Tang ◽  
Li Chang Chuang ◽  
Hong Tsu Young ◽  
Mike Yang ◽  
Hsueh Chuan Liao

The robust design of chemical etching parameters is dealing with the optimization of the through-silicon via (TSV) roundness error and TSV lateral etching depth in the etching of silicon for laser drilled TSVs. The considered wet chemical etching parameters comprise the HNO3 molarity, HF molarity, and etching time. Grey-Taguchi method is combining the orthogonal array design of experiments with Grey relational analysis (GRA), which enables the determination of the optimal combination of wet chemical etching parameters for multiple process responses. The concept of Grey relational analysis is to find a Grey relational grade, which can be used for the optimization conversion from a multiple objective case to a single objective case. Also, GRG is used to investigate the parameter effects to the overall quality targets.


2006 ◽  
Vol 41 (1) ◽  
pp. 120-122 ◽  
Author(s):  
Xiangming He ◽  
Chunrong Wan

2004 ◽  
Vol 38 (3) ◽  
pp. 255-261 ◽  
Author(s):  
Z.Y. Zhu ◽  
J.L. Duan ◽  
Y. Maekawa ◽  
H. Koshikawa ◽  
M. Yoshida
Keyword(s):  

Author(s):  
Alexander Kiy ◽  
Christian Notthoff ◽  
Shankar Dutt ◽  
Mark Grigg ◽  
Andrea Hadley ◽  
...  

In situ small angle X-ray scattering (SAXS) measurements of ion track etching of polycarbonate foils are used to directly monitor the selective dissolution of ion tracks with high precision, including...


2005 ◽  
Vol 40 (2-6) ◽  
pp. 289-294 ◽  
Author(s):  
David Pusset ◽  
Michel Fromm ◽  
Hatem Boulahdour ◽  
Takao Tsuruta

1968 ◽  
Vol 32 (10) ◽  
pp. 1126-1128 ◽  
Author(s):  
R.L Fleischer ◽  
D.B Lovett

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