Pulse switching characterization of organometallic chemical vapor deposited PbZrxTi1−xO3 thin films for high-density memory applications

1995 ◽  
Vol 7 (1-4) ◽  
pp. 123-138 ◽  
Author(s):  
D. J. Taylor ◽  
P. K. Larsen ◽  
G. J. M. Dormans ◽  
A. E.M de Veirman
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
High Density ◽  
Pulse Switching ◽  
Chemical Vapor Deposited ◽  
Memory Applications

Characterization of chemical-vapor-deposited low-k thin films using x-ray porosimetry

2003 ◽  
Vol 82 (7) ◽  
pp. 1084-1086 ◽  
Author(s):  
Hae-Jeong Lee ◽  
Eric K. Lin ◽  
Barry J. Bauer ◽  
Wen-li Wu ◽  
Byung Keun Hwang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
X Ray ◽  
Chemical Vapor Deposited ◽  
Low K

Tribological characterization of chemical vapor deposited Co and Co 3 O 4 thin films for sensing reliability in engineering applications

2015 ◽  
Vol 82 ◽  
pp. 89-94 ◽  
Author(s):  
Elias P. Koumoulos ◽  
Vassileios Markakis ◽  
Vasiliki P. Tsikourkitoudi ◽  
Costas A. Charitidis ◽  
Nikolaos Papadopoulos ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Engineering Applications ◽  
Chemical Vapor Deposited ◽  
Tribological Characterization

Preparation and characterization of metalorganic chemical vapor deposited nickel oxide and lithium nickel oxide thin films

2007 ◽  
Vol 42 (8) ◽  
pp. 2758-2765 ◽  
Author(s):  
M. A. Eleruja ◽  
G. O. Egharevba ◽  
O. A. Abulude ◽  
O. O. Akinwunmi ◽  
C. Jeynes ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Chemical Vapor ◽  
Oxide Thin Films ◽  
Lithium Nickel Oxide ◽  
Chemical Vapor Deposited ◽  
Metalorganic Chemical ◽  
Nickel Oxide Thin Films
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