Characterization of (Ba0.5Sr0.5)TiO3 thin films deposited onto metalorganic chemical vapor deposited (Ba,Sr)RuO3 (BSR) seed layers for voltage tunable devices

2001 ◽  
Vol 39 (1-4) ◽  
pp. 281-289
Author(s):  
Young-Ah Jeon ◽  
Eun-Suck Choi ◽  
Soon-Gil Yoon
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited ◽  
Metalorganic Chemical ◽  
Seed Layers

Preparation and characterization of metalorganic chemical vapor deposited nickel oxide and lithium nickel oxide thin films

2007 ◽  
Vol 42 (8) ◽  
pp. 2758-2765 ◽  
Author(s):  
M. A. Eleruja ◽  
G. O. Egharevba ◽  
O. A. Abulude ◽  
O. O. Akinwunmi ◽  
C. Jeynes ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Chemical Vapor ◽  
Oxide Thin Films ◽  
Lithium Nickel Oxide ◽  
Chemical Vapor Deposited ◽  
Metalorganic Chemical ◽  
Nickel Oxide Thin Films

Preparation and characterization of single crystalline anatase TiO2 films on LSAT (001) by MOCVD

RSC Advances ◽  
2016 ◽  
Vol 6 (6) ◽  
pp. 4867-4871 ◽  
Author(s):  
Mingxian Wang ◽  
Weiguang Wang ◽  
Zhao Li ◽  
Xuejian Du ◽  
Xianjin Feng ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Anatase Tio2 ◽  
Tio2 Films ◽  
Anatase Structure ◽  
Metalorganic Chemical

TiO2 thin films with anatase structure have been prepared on [LaAlO3]0.3[SrAl0.5Ta0.5O3]0.7 (LSAT) (001) substrates by metalorganic chemical vapor deposition (MOCVD) in the substrate temperature range of 500–650 °C.

Characterization of chemical-vapor-deposited low-k thin films using x-ray porosimetry

2003 ◽  
Vol 82 (7) ◽  
pp. 1084-1086 ◽  
Author(s):  
Hae-Jeong Lee ◽  
Eric K. Lin ◽  
Barry J. Bauer ◽  
Wen-li Wu ◽  
Byung Keun Hwang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
X Ray ◽  
Chemical Vapor Deposited ◽  
Low K

High-resolution electron microscopy investigations of stacking faults in Y1Ba2Cu3O7−δ metalorganic chemical vapor deposited thin films

1999 ◽  
Vol 14 (7) ◽  
pp. 2732-2738 ◽  
Author(s):  
Ch. Grigis ◽  
S. Schamm ◽  
D. Dorignac
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
High Resolution ◽  
Image Matching ◽  
Chemical Vapor ◽  
High Resolution Electron Microscopy ◽  
Resolution Electron ◽  
Chemical Vapor Deposited ◽  
Structural Imperfections ◽  
Metalorganic Chemical

New structural planar defects in Ba-deficient Y1Ba2Cu3O7−δ (YBCO) (1:1.6:3) thin films grown on NdGaO3 and SrTiO3 substrates by metalorganic chemical vapor deposition have been observed by means of high-resolution electron microscopy. The defects are associated with perturbations of the YBCO “1:2:3” stacking sequences along the c direction, which give rise to structural variants with locally “2:5:7,” “3:4:7,” or “4:6:10” cationic stoichiometries. The defects can be consistently interpreted as CuO–YO–CuO/CuO conversions or YO/BaO (BaO/YO) interconversions in the (a,b) planes and extending over a few nanometers along the c axis. Structural models based on image matching with simulations are proposed for two particular cases. It is thought that these structural imperfections can be effective sites of flux pinning.

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