Structural and mechanical properties of chromium nitride, molybdenum nitride, and tungsten nitride thin films

2003 ◽  
Vol 36 (8) ◽  
pp. 1023-1029 ◽  
Author(s):  
Peter Hones ◽  
Nicolas Martin ◽  
Manfred Regula ◽  
Francis L vy
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Chromium Nitride ◽  
Molybdenum Nitride ◽  
Tungsten Nitride ◽  
And Tungsten

Microstructural and Mechanical Properties of Nanostructured Tungsten Nitride Thin Films Prepared by RF Reactive Magnetron Sputtering

2018 ◽  
Vol 24 (8) ◽  
pp. 5872-5876
Author(s):  
G Balakrishnan ◽  
V Sathiyaraj ◽  
M Dinesh ◽  
P. Naveen Chandran ◽  
C Thamotharan
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Nitrogen Content ◽  
High Hardness ◽  
Reactive Magnetron Sputtering ◽  
Tungsten Nitride ◽  
Reactive Magnetron ◽  
Microstructural Property ◽  
Steel Substrates

In the present work, nanostructured tungsten nitride (WN) thin films were deposited by RF reactive magnetron sputtering technique in a mixture of N2 and Argon atmosphere and its microstructure and mechanical properties were investigated. The Argon pressure was kept constant at 20 sccm, while the N2 partial pressures were varied (3%, 5%, 10% and 15%). The WN thin films are deposited on SS304 stainless steel substrates at a temperature of 500 °C. The microstructural property was analyzed using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) and mechanical properties were evaluated by nanoindentation technique. The XRD studies indicated the formation of different phases as a function of nitrogen content. The hardness and the young’s modulus values were in the range 27–39 GPa and 239–280 GPa, respectively. The high hardness values correspond to the coatings with the low nitrogen content and vice-versa. The mechanical properties of the tungsten nitride coatings were strongly influenced by the microstructure.

scholarly journals Characterization and properties of highly adhesive titanium nitride and tungsten nitride thin films

2008 ◽  
Vol 113 ◽  
pp. 012025 ◽  
Author(s):  
I N Martev ◽  
D A Dechev ◽  
N P Ivanov ◽  
T D Uzunov ◽  
E P Kashchieva
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Tungsten Nitride ◽  
And Tungsten

Influence of the ion–atom flux ratio on the mechanical properties of chromium nitride thin films

Vacuum ◽  
2007 ◽  
Vol 81 (5) ◽  
pp. 610-618 ◽  
Author(s):  
J.J. Olaya ◽  
G. Wei ◽  
S.E. Rodil ◽  
S. Muhl ◽  
B. Bhushan
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Flux Ratio ◽  
Chromium Nitride ◽  
Atom Flux

Si Doped and Un-Doped CrN Thin Films Produced by Magnetron Sputtering: Structural and Mechanical Properties

2012 ◽  
Vol 18-19 ◽  
pp. 201-211 ◽  
Author(s):  
L. Cunha ◽  
C. Moura
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Crystallite Size ◽  
Processing Parameters ◽  
Preferred Orientation ◽  
Chromium Nitride ◽  
Face Centered Cubic ◽  
Face Centered ◽  
Silicon Doped

Chromium nitride and silicon doped chromium nitride thin films have been deposited by r.f. reactive magnetron sputtering. The effect of processing parameters on the properties of chromium nitride films and the correspondent influence of the addition of silicon on the chromium nitride matrix in the films structure and mechanical properties have been investigated. The characterization of the coatings was performed by X-ray diffraction (XRD), and nano-indentation experiments. These studies allow analyzing the crystalline phases, crystal orientation/texture, crystallite size, mechanical properties and the relations between the characteristics of the films. The increase of the nitrogen partial pressure in the working atmosphere produces changes from a body-centered cubic (bcc) Cr structure, to hexagonal Cr2N to face-centered cubic (fcc) CrN structure, with CrN (111) preferred orientation. For the films with a dominant Cr2N phase the hardness has a relative maximum (42 GPa). The highest hardness was measured for a coating with dominant CrN phase (45 GPa) with a crystallite size around 18 nm. The addition of Si, in the films with CrN dominant phase, maintains the CrN (111) preferred orientation and produced variable changes in films hardness, depending on deposition conditions.

Nanoindentation and Microstructural Evolution Studies of DC Magnetron Sputtered Chromium Nitride Thin Films

2001 ◽  
Vol 672 ◽  
Author(s):  
A.B. Agarwal ◽  
B.A. Rainey ◽  
S.M. Yalisove ◽  
J.C. Bilello
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Elastic Modulus ◽  
Flow Rate ◽  
Chromium Nitride ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
Flow Rates ◽  
Chromium Nitrides ◽  
Deposited Films

ABSTRACTNanoindentation experiments have been performed to assess the mechanical behavior of chromium nitride (CrxNy) thin films sputtered in different deposition geometries and with varying Ar and N2 pressures. The hardness and elastic modulus of chromium nitrides are of great interest with regard to their applications. In the present work, two different deposition geometries, i.e. multi-substrate and confocal, were used to sputter (DC magnetron) a CrxNy layer on Si (100) wafers at varying nitrogen flow rates. The results of the nanoindentation experiments indicate that, over a similar argon and nitrogen regime, the CrxNy films grown in a multi- substrate geometry exhibit higher hardness and elastic modulus on the average than those grown in the confocal geometry. Furthermore, it was found that in the multi-substrate geometry the hardness and elastic modulus of the films were significantly higher than those in the confocally deposited films for a specific regime of the nitrogen flow rate (10-14 sccm). Finally, observations of the mechanical properties trends could be correlated with a higher degree of anisotropic stress for films grown in the multi-substrate in comparison to the confocal geometry.

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