Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: I. Scaling with high frequency

Plasma Sources Science and Technology ◽

10.1088/0963-0252/19/5/055011 ◽

2010 ◽

Vol 19 (5) ◽

pp. 055011 ◽

Author(s):

Yang Yang ◽

Mark J Kushner

Keyword(s):

High Frequency ◽

Dual Frequency ◽

Plasma Sources ◽

Capacitively Coupled ◽

Full Wave ◽

Capacitively Coupled Plasma

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Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: II. Scaling with pressure, power and electronegativity

Plasma Sources Science and Technology ◽

10.1088/0963-0252/19/5/055012 ◽

2010 ◽

Vol 19 (5) ◽

pp. 055012 ◽

Author(s):

Yang Yang ◽

Mark J Kushner

Keyword(s):

Dual Frequency ◽

Plasma Sources ◽

Capacitively Coupled ◽

Full Wave ◽

Capacitively Coupled Plasma

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Effect of high-frequency variation on the etch characteristics of ArF photoresist and silicon nitride layers in dual frequency superimposed capacitively coupled plasma

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.2009770 ◽

2005 ◽

Vol 23 (5) ◽

pp. 2203 ◽

Author(s):

D. H. Kim ◽

C. H. Lee ◽

S. H. Cho ◽

N.-E. Lee ◽

G. C. Kwon

Keyword(s):

Silicon Nitride ◽

High Frequency ◽

Frequency Variation ◽

Dual Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma ◽

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Effect of high-frequency variation on ArF photoresist deformation during superimposed dual frequency (DFS) capacitively coupled plasma etching

Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. ◽

10.1109/imnc.2004.245789 ◽

2004 ◽

Author(s):

D.H. Kim ◽

S.H. Cho ◽

N.-E. Lee

Keyword(s):

Plasma Etching ◽

High Frequency ◽

Frequency Variation ◽

Dual Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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450 mm dual frequency capacitively coupled plasma sources: Conventional, graded, and segmented electrodes

Journal of Applied Physics ◽

10.1063/1.3517104 ◽

2010 ◽

Vol 108 (11) ◽

pp. 113306 ◽

Author(s):

Yang Yang ◽

Mark J. Kushner

Keyword(s):

Dual Frequency ◽

Plasma Sources ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Graded conductivity electrodes as a means to improve plasma uniformity in dual frequency capacitively coupled plasma sources

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/43/15/152001 ◽

2010 ◽

Vol 43 (15) ◽

pp. 152001 ◽

Author(s):

Yang Yang ◽

Mark J Kushner

Keyword(s):

Dual Frequency ◽

Plasma Sources ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

Plasma Science and Technology ◽

10.1088/1009-0630/18/2/08 ◽

2016 ◽

Vol 18 (2) ◽

pp. 143-146

Author(s):

Hongyu Wang ◽

Wei Jiang ◽

Peng Sun ◽

Shuangyun Zhao ◽

Yang Li

Keyword(s):

Dual Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Effect of low-frequency power on etching of SiCOH low-k films in CHF3 13.56MHz/2MHz dual-frequency capacitively coupled plasma

Microelectronic Engineering ◽

10.1016/j.mee.2008.12.037 ◽

2009 ◽

Vol 86 (3) ◽

pp. 421-424 ◽

Author(s):

Chao Ye ◽

Yijun Xu ◽

Xiaojiang Huang ◽

Zhenyu Xing ◽

Jing Yuan ◽

...

Keyword(s):

Low Frequency ◽

Dual Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma ◽

Low Frequency Power ◽

Low K ◽

Frequency Power

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Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2771558 ◽

2007 ◽

Vol 25 (5) ◽

pp. 1420 ◽

Author(s):

Yang Yang ◽

Mark J. Kushner

Keyword(s):

Plasma Sources ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Etch Characteristics of SiO2 in the CxFy Dual-frequency Capacitively Coupled Plasma

ECS Meeting Abstracts ◽

10.1149/ma2009-02/1/27 ◽

2009 ◽

Keyword(s):

Dual Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Plasma Uniformity in a Dual Frequency Capacitively Coupled Plasma Reactor Measured by Optical Emission Spectroscopy

Plasma Science and Technology ◽

10.1088/1009-0630/13/1/13 ◽

2011 ◽

Vol 13 (1) ◽

pp. 61-67 ◽

Author(s):

Guoli Zhao ◽

Yong Xu ◽

Jianping Shang ◽

Wenyao Liu ◽

Aimin Zhu ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Plasma Reactor ◽

Optical Emission ◽

Dual Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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