Effect of high-frequency variation on the etch characteristics of ArF photoresist and silicon nitride layers in dual frequency superimposed capacitively coupled plasma

2005 ◽  
Vol 23 (5) ◽  
pp. 2203 ◽  
Author(s):  
D. H. Kim ◽  
C. H. Lee ◽  
S. H. Cho ◽  
N.-E. Lee ◽  
G. C. Kwon
Keyword(s):  
Silicon Nitride ◽  
High Frequency ◽  
Frequency Variation ◽  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma ◽  
Nitride Layers

scholarly journals Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

2016 ◽  
Vol 18 (2) ◽  
pp. 143-146
Author(s):  
Hongyu Wang ◽  
Wei Jiang ◽  
Peng Sun ◽  
Shuangyun Zhao ◽  
Yang Li
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)

2015 ◽  
Author(s):  
Yannick Feurprier ◽  
Katie Lutker-Lee ◽  
Vinayak Rastogi ◽  
Hiroie Matsumoto ◽  
Yuki Chiba ◽  
...  
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma
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