Effect of high-frequency variation on ArF photoresist deformation during superimposed dual frequency (DFS) capacitively coupled plasma etching

2004 ◽  
Author(s):  
D.H. Kim ◽  
S.H. Cho ◽  
N.-E. Lee
Keyword(s):  
Plasma Etching ◽  
High Frequency ◽  
Frequency Variation ◽  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

scholarly journals Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

2016 ◽  
Vol 18 (2) ◽  
pp. 143-146
Author(s):  
Hongyu Wang ◽  
Wei Jiang ◽  
Peng Sun ◽  
Shuangyun Zhao ◽  
Yang Li
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)

2015 ◽  
Author(s):  
Yannick Feurprier ◽  
Katie Lutker-Lee ◽  
Vinayak Rastogi ◽  
Hiroie Matsumoto ◽  
Yuki Chiba ◽  
...  
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma
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