Effect of Discharge Parameters on Properties of Diamond-Like Carbon Films Prepared by Dual-Frequency Capacitively Coupled Plasma Source

2010 ◽  
Vol 12 (1) ◽  
pp. 53-58 ◽  
Author(s):  
Yang Lei ◽  
Xin Yu ◽  
Xu Haipeng ◽  
Yu Yiqing ◽  
Ning Zhaoyuan
Keyword(s):  
Plasma Source ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Dual Frequency ◽  
Capacitively Coupled ◽  
Discharge Parameters ◽  
Capacitively Coupled Plasma

scholarly journals Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

2016 ◽  
Vol 18 (2) ◽  
pp. 143-146
Author(s):  
Hongyu Wang ◽  
Wei Jiang ◽  
Peng Sun ◽  
Shuangyun Zhao ◽  
Yang Li
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

scholarly journals Preparation of Aniline-Based Nitrogen-Containing Diamond-Like Carbon Films with Low Electrical Resistivity

Coatings ◽  
2020 ◽  
Vol 10 (1) ◽  
pp. 54 ◽  
Author(s):  
Ruriko Hatada ◽  
Stefan Flege ◽  
Wolfgang Ensinger ◽  
Sabine Hesse ◽  
Shuji Tanabe ◽  
...  
Keyword(s):  
Electrical Resistivity ◽  
Reference Sample ◽  
Plasma Source ◽  
Carbon Films ◽  
Limited Area ◽  
Diamond Like Carbon ◽  
Film Properties ◽  
High Electrical Resistivity ◽  
Plasma Source Ion Implantation ◽  
Lower Resistivity

The intrinsic high electrical resistivity of diamond-like carbon (DLC) films prevents their use in certain applications. The addition of metal or nitrogen during the preparation of the DLC films leads to a lower resistivity of the films, but it is usually accompanied by several disadvantages, such as a potential contamination risk for surfaces in contact with the film, a limited area that can be coated, deteriorated mechanical properties or low deposition rates of the films. To avoid these problems, DLC films have been prepared by plasma source ion implantation using aniline as a precursor gas, either in pure form or mixed with acetylene. The nitrogen from the precursor aniline is incorporated into the DLC films, leading to a reduced electrical resistivity. Film properties such as hardness, surface roughness and friction coefficient are nearly unchanged as compared to an additionally prepared reference sample, which was deposited using only pure acetylene as precursor gas.

Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)

2015 ◽  
Author(s):  
Yannick Feurprier ◽  
Katie Lutker-Lee ◽  
Vinayak Rastogi ◽  
Hiroie Matsumoto ◽  
Yuki Chiba ◽  
...  
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma
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