Magnetically Enhanced Dual Frequency Capacitively Coupled Plasma Source for Large-area Wafer Processing

1998 ◽  
Vol 37 (Part 1, No. 11) ◽  
pp. 6193-6198 ◽  
Author(s):  
Sunil Wickramanayaka ◽  
Yukito Nakagawa
Keyword(s):  
Plasma Source ◽  
Dual Frequency ◽  
Large Area ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma ◽  
Wafer Processing

scholarly journals Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

2016 ◽  
Vol 18 (2) ◽  
pp. 143-146
Author(s):  
Hongyu Wang ◽  
Wei Jiang ◽  
Peng Sun ◽  
Shuangyun Zhao ◽  
Yang Li
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

Effect of Segmenting Powered Electrode on Plasma Uniformity in Large-Area Capacitively Coupled Plasma Discharge

2011 ◽  
Vol 39 (11) ◽  
pp. 2526-2527 ◽  
Author(s):  
Zhigang Chen ◽  
Jason Kenney ◽  
Shahid Rauf ◽  
Ken Collins ◽  
Tom Tanaka ◽  
...  
Keyword(s):  
Plasma Discharge ◽  
Large Area ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)

2015 ◽  
Author(s):  
Yannick Feurprier ◽  
Katie Lutker-Lee ◽  
Vinayak Rastogi ◽  
Hiroie Matsumoto ◽  
Yuki Chiba ◽  
...  
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma
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