A Comprehensive Account of Biomedical Applications of CVD Diamond Coatings

Author(s):  
Mohsin Ali ◽  
Faizan Ali ◽  
Boxiong Yang ◽  
Akmal Abbas
2010 ◽  
Vol 205 (1) ◽  
pp. 158-167 ◽  
Author(s):  
Qiuping Wei ◽  
Z.M. Yu ◽  
Michael N.R. Ashfold ◽  
Z. Chen ◽  
L. Wang ◽  
...  

Wear ◽  
2013 ◽  
Vol 303 (1-2) ◽  
pp. 225-234 ◽  
Author(s):  
E. Salgueiredo ◽  
C.S. Abreu ◽  
M. Amaral ◽  
F.J. Oliveira ◽  
J.R. Gomes ◽  
...  
Keyword(s):  

2008 ◽  
Vol 375-376 ◽  
pp. 92-96 ◽  
Author(s):  
Wen Zhuang Lu ◽  
Dun Wen Zuo ◽  
Min Wang ◽  
Feng Xu

Electroplated Cr, Ni and Cu were used as interlayer for chemical vapor deposition (CVD) diamond coating on WC–Co cemented carbide cutting tools. The electroplated interlayers were studied by Scanning Electron Microscope (SEM), Electron Probe Micro Analyzer (EPMA) and X-ray diffraction (XRD). The CVD diamond coatings were studied by SEM and Raman Scattering Spectroscopy (Raman). The experimental results show that there is diffusion bonded interface between electroplated layer and WC-Co substrate after H plasma treatment, the bond between electroplated layers and WC-Co substrate changes from mechanical bond to metallurgical bond and the adhesion becomes stronger. Electroplated Cr interlayer forms new phases of Cr3C2 and Cr7C3 under CVD conditions, while electroplated Ni and Cu interlayers do not form carbides under CVD conditions. Cr carbides have good chemical compatibility to diamond, and they are propitious to diamond nucleation and growth during the deposition period. The diamond crystal microstructure, diamond quality and adhesion on Cr interlayer are better than those on electroplated Ni and Cu interlayers.


2006 ◽  
Vol 532-533 ◽  
pp. 480-483 ◽  
Author(s):  
Wen Zhuang Lu ◽  
Dun Wen Zuo ◽  
Min Wang ◽  
Feng Xu

Chemical vapor deposition (CVD) diamond coatings were deposited on cemented carbide cutting cools by an electron-assisted hot filament chemical vapor deposition (EACVD) equipment developed by the authors. The CVD diamond coatings were studied by Scanning Electron Microscope (SEM) and Raman Scattering Spectroscopy (Raman). The experimental results show that CH4 concentration in the source gas performs great influence on the micro-structure, surface roughness, composition, residual stress and adhesion of the CVD diamond coatings. The increase of CH4 concentration results the change of diamond crystal from {111} orientation to {100} orientation, the decrease of the surface roughness and the increase of sp2 carbon in the CVD diamond coatings. A residual compressive stress exists in the CVD diamond coatings. The residual stress decreases with increasing CH4 concentration. A higher or lower CH4 concentration tends to reduce adhesion stress of the continuous CVD diamond coatings.


2017 ◽  
Vol 73 ◽  
pp. 190-198 ◽  
Author(s):  
Shabani M. ◽  
Abreu C.S. ◽  
Gomes J.R. ◽  
Silva R.F. ◽  
Oliveira F.J.

2004 ◽  
Vol 187 (1) ◽  
pp. 33-36 ◽  
Author(s):  
Jinqi Miao ◽  
Jianhua Song ◽  
Yundong Xue ◽  
Yumei Tong ◽  
Weizhong Tang ◽  
...  

2014 ◽  
Vol 907 ◽  
pp. 63-73 ◽  
Author(s):  
Eckart Uhlmann ◽  
Fiona Sammler

The economic machining of materials used in the automotive and aeronautical industries, such as aluminium silicon alloys is often not possible without the use of superhard tools. CVD diamond coated tools have demonstrated their suitability for these applications in the past, however, the insufficient coating adhesion and thus tool failure remains an issue to date. Within the work presented here, two cemented carbide types were studied as substrates for CVD diamond coatings. Milling and turning tests were undertaken in order to assess the coating adhesion of the diamond tools. Furthermore, residual stress analysis was undertaken with the aim of understanding the impact of the coating and substrate residual stresses on the tool’s process performance.


Author(s):  
F.A. Almeida ◽  
J.M. Carrapichano ◽  
A.J.S. Fernandes ◽  
J. Sacramento ◽  
R.F. Silva ◽  
...  
Keyword(s):  

1998 ◽  
Vol 98 (1-3) ◽  
pp. 1060-1065 ◽  
Author(s):  
K. Vandierendonck ◽  
M. Nesládek ◽  
S. Kadlec ◽  
C. Quaeyhaegens ◽  
M. Van Stappen ◽  
...  

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