scholarly journals Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge

2021 ◽  
Vol 55 (1) ◽  
pp. 015202
Author(s):  
M Rudolph ◽  
N Brenning ◽  
H Hajihoseini ◽  
M A Raadu ◽  
T M Minea ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Magnetron Sputtering ◽  
High Power ◽  
The Magnetic Field

Steady state discharge optimization in high-power impulse magnetron sputtering through the control of the magnetic field

2012 ◽  
Vol 111 (2) ◽  
pp. 023301 ◽  
Author(s):  
J. Čapek ◽  
M. Hála ◽  
O. Zabeida ◽  
J. E. Klemberg-Sapieha ◽  
L. Martinu
Keyword(s):  
Magnetic Field ◽  
Steady State ◽  
Magnetron Sputtering ◽  
High Power ◽  
The Magnetic Field

Magnetic field influence on ionization zones in high-power impulse Magnetron Sputtering

Vacuum ◽  
2018 ◽  
Vol 156 ◽  
pp. 9-19 ◽  
Author(s):  
Priya Raman ◽  
Matthew Cheng ◽  
Justin Weberski ◽  
Wenyu Xu ◽  
Thomas Houlahan ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Magnetron Sputtering ◽  
High Power ◽  
Field Influence

Magnetic Field Analysis for Magnetron Sputtering Apparatus for Accurate Composition Control

2009 ◽  
Vol 154 ◽  
pp. 175-179 ◽  
Author(s):  
Yutaka Sakurai ◽  
Ryo Nakajima ◽  
Hiroko Nakamura
Keyword(s):  
Magnetic Field ◽  
Finite Element Method ◽  
Magnetron Sputtering ◽  
Field Analysis ◽  
The Finite Element Method ◽  
Film Composition ◽  
Composite Target ◽  
Composition Control ◽  
Magnetic Field Analysis ◽  
The Magnetic Field

Authors use magnetron sputtering technique for controlling the film composition by modifying the magnetic field with an external solenoid in addition to the magnetic field with a permanent magnet on back of composite target. It is necessary to understand the contribution of the solenoid quantitatively for the effective application of this technique. The magnetic field changes by the solenoid current on the target were calculated by the finite element method (FEM), and compared with the film composition. As the solenoid current increases, magnetic tunnel region on the target (correspond with the well sputtered region by the confined plasma) moves to the centre of the target. The behaviour corresponds with the actually formed film composition. The calculated results also give an information to design the composite target and the correction value for using the already eroded target.

A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations

2016 ◽  
Vol 120 (16) ◽  
pp. 163301 ◽  
Author(s):  
Priya Raman ◽  
Justin Weberski ◽  
Matthew Cheng ◽  
Ivan Shchelkanov ◽  
David N. Ruzic
Keyword(s):  
Magnetic Field ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
High Deposition Rate
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