Tuning the electronic properties of highly anisotropic 2D dangling-bond-free sheets from 1D V2Se9 chain structures

2020 ◽  
Vol 32 (9) ◽  
pp. 095203
Author(s):  
Weon-Gyu Lee ◽  
Dongchul Sung ◽  
Junho Lee ◽  
You Kyoung Chung ◽  
Bum Jun Kim ◽  
...  
2016 ◽  
Vol 18 (5) ◽  
pp. 3854-3861 ◽  
Author(s):  
Szymon Godlewski ◽  
Marek Kolmer ◽  
Mads Engelund ◽  
Hiroyo Kawai ◽  
Rafal Zuzak ◽  
...  

Starphene molecules are weakly attached to single dangling bond quantum dots, retaining the unperturbed originally designed electronic properties.


2009 ◽  
Vol 95 (22) ◽  
pp. 222106 ◽  
Author(s):  
V. V. Afanas’ev ◽  
M. Houssa ◽  
A. Stesmans ◽  
L. Souriau ◽  
R. Loo ◽  
...  

1985 ◽  
Vol 63 (6) ◽  
pp. 846-851 ◽  
Author(s):  
T. V. Herak ◽  
R. D. McLeod ◽  
M. G. Collett ◽  
K. C. Kao ◽  
H. C. Card ◽  
...  

The optical and electronic properties of a-SiNx:H alloy films fabricated by rf glow discharge have been measured for 0 ≤ x ≤ 0.6. The material is dispersive over the range of photon energies 0.5 ≤ hv ≤ 3.5 eV. The optical gap is about 1.65 eV and is practically independent of x for 0.1 < x < 0.4, but it increases rapidly with increasing x for 0 < x < 0.1 and x > 0.4. For x > 0.6 the refractive index approaches the value for Si3N4. The dark conductivity, the photoconductivity, and the ratio of the photoconductivity to the dark conductivity are enhanced by nitrogen incorporation when appropriate nitrogen content is used. All the experimental results indicate that the incorporated nitrogen does not act as a dopant, but rather acts as a dangling-bond compensator. Photo-induced changes in both dark conductivity and photoconductivity due to high-intensity optical excitation have been observed. The degree of such changes decreases with increasing nitrogen content. This phenomenon is attributed to the photo-induced change in the microstructure of the films that leads to a change in both the density and the distribution of gap states.


1990 ◽  
Vol 192 ◽  
Author(s):  
R. Biswas ◽  
I. Kwon ◽  
C. M. Soukoulis

ABSTRACTAmorphous silicon models have been computer-generated by melt-quenching and film deposition molecular dynamics simulations, employing classical interatomic Si-potentials. The structural, vibrational and electronic properties of these models is described. Dangling-bond gap states are well localized whereas, floating bonds gap states are considerably less localized with wavefunction amplitudes on the neighbors of the five-coordinated atom. In contrast to melt-quenched models, the a-Si films displayed voids, a 15–28% lower density than c-Si, and no five- coordinated atoms. A-Si:H models with 5 and 22% hydrogen, and both monohydride and dihydride species, have also been developed.


2012 ◽  
Vol 86 (12) ◽  
Author(s):  
Marek Kolmer ◽  
Szymon Godlewski ◽  
Hiroyo Kawai ◽  
Bartosz Such ◽  
Franciszek Krok ◽  
...  

2006 ◽  
Vol 73 (16) ◽  
Author(s):  
Alberto Martinez-Limia ◽  
Philipp Plänitz ◽  
Christian Radehaus

1991 ◽  
Vol 219 ◽  
Author(s):  
R. A. Street

ABSTRACTIt is proposed that hydrogen reactions near the growing surface control the structure of plasma-deposited amorphous silicon and its alloys. The model explains how the plasma influences the dangling bond density and silicon weak bond distribution, which are the main parameters influencing the electronic properties. The hydrogen interactions account for the dependence of the electronic structure on growth conditions, the transition to microcrystalline growth in hydrogen-rich plasmas, and the different electronic properties of a-Si:H alloys. The proposed growth mechanisms are closely related to the metastability phenomena which occur in bulk a-Si:H films.


Author(s):  
J.M. Bonar ◽  
R. Hull ◽  
R. Malik ◽  
R. Ryan ◽  
J.F. Walker

In this study we have examined a series of strained heteropeitaxial GaAs/InGaAs/GaAs and InGaAs/GaAs structures, both on (001) GaAs substrates. These heterostructures are potentially very interesting from a device standpoint because of improved band gap properties (InAs has a much smaller band gap than GaAs so there is a large band offset at the InGaAs/GaAs interface), and because of the much higher mobility of InAs. However, there is a 7.2% lattice mismatch between InAs and GaAs, so an InxGa1-xAs layer in a GaAs structure with even relatively low x will have a large amount of strain, and misfit dislocations are expected to form above some critical thickness. We attempt here to correlate the effect of misfit dislocations on the electronic properties of this material.The samples we examined consisted of 200Å InxGa1-xAs layered in a hetero-junction bipolar transistor (HBT) structure (InxGa1-xAs on top of a (001) GaAs buffer, followed by more GaAs, then a layer of AlGaAs and a GaAs cap), and a series consisting of a 200Å layer of InxGa1-xAs on a (001) GaAs substrate.


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