Effects of thin coating on guided mode and sidewall-roughness scattering loss in slot waveguides

2020 ◽  
Vol 95 (4) ◽  
pp. 045502
Author(s):  
Yu Wang ◽  
Yameng Xu ◽  
Xin Liu ◽  
Mei Kong
2021 ◽  
Author(s):  
Geng Wang ◽  
Zhonglei Gao ◽  
Mingyu Wu ◽  
Guoqiang Wang ◽  
Sudong Xiao ◽  
...  

Abstract Electromagnetic ion cyclotron (EMIC) waves can cause the scattering loss of the relativistic electrons in the earth's radiation belt. They can be classified into the guided mode and the unguided mode, according to waves propagation behavior. The guided mode waves have been widely investigated in the radiation belt, but the observation of the unguided mode waves have not been expected. Based on the observations of Van Allen Probes, we demonstrate for the first time the existence of the intense unguided mode EMIC waves. The reflection interface formed by the spatial locations of local helium cutoff frequencies can be nearly parallel to the equatorial plane when the proton abundance ratio decreases sharply with L-shell. This structure combined with the anisotropic hot protons can lead to the trapping and significant amplification of the unguided mode waves. These results may help to understand the nature of EMIC waves in the radiation belt.


Sensors ◽  
2019 ◽  
Vol 19 (15) ◽  
pp. 3383 ◽  
Author(s):  
Yu Xin ◽  
Gregory Pandraud ◽  
Yongmeng Zhang ◽  
Paddy French

In this paper, we propose a novel vertical SU-8 waveguide for evanescent analyte sensing. The waveguide is designed to possess a vertical and narrow structure to generate evanescent waves on both sides of the waveguide’s surface, aimed at increasing the sensitivity by enlarging the sensing areas. We performed simulations to monitor the influence of different parameters on the waveguide’s performance, including its height and width. E-beam lithography was used to fabricate the structure, as this one-step direct writing process enables easy, fast, and high-resolution fabrication. Furthermore, it reduces the sidewall roughness and decreases the induced scattering loss, which is a major source of waveguide loss. Couplers were added to improve the coupling efficiency and alignment tolerance, and will contribute to the feasibility of a plug-and-play optical system. Optical measurements show that the transmission loss is 1.03 ± 0.19 dB/cm. The absorption sensitivity was measured to be 4.8 dB per refractive index unit (dB/RIU) for saline solutions with various concentrations.


2011 ◽  
Vol 37 (1) ◽  
pp. 13 ◽  
Author(s):  
Haishan Sun ◽  
Antao Chen ◽  
Don Abeysinghe ◽  
Attila Szep ◽  
Richard S. Kim

2013 ◽  
Vol 5 (3) ◽  
pp. 6601010-6601010 ◽  
Author(s):  
E. Jaberansary ◽  
T. M. B. Masaud ◽  
M. M. Milosevic ◽  
M. Nedeljkovic ◽  
G. Z. Mashanovich ◽  
...  

2009 ◽  
Vol 27 (18) ◽  
pp. 3999-4008 ◽  
Author(s):  
Kuan Pei Yap ◽  
A. Delage ◽  
J. Lapointe ◽  
B. Lamontagne ◽  
J.H. Schmid ◽  
...  

2012 ◽  
Vol 26 (03) ◽  
pp. 1150018 ◽  
Author(s):  
YUN-FEI YAN ◽  
PENG-CHENG ZHAO ◽  
CHUAN-TAO ZHENG ◽  
XIAO-QIANG SUN ◽  
DE-HUI LI ◽  
...  

A polymer-on-silica Mach–Zehnder interferometer (MZI) TO switch is experimentally demonstrated using core polymer material with large thermo-optic (TO) coefficient. In the hybrid structure, the negative photoresist SU-8 and silica are used as core and lower cladding, respectively. Wet-etching technique is adopted to optimize fabrication process and diminish sidewall roughness and scattering loss. Compared to our two previously reported works, this switch exhibits better performance with lower power consumption of less than 4.8 mW, higher extinction ratio of 22.5 dB, shorter rise time of 141 μs and fall time of 87 μs, due to the larger thermal conductivity of silica relative to polymer in the proposed hybrid configuration.


2006 ◽  
Vol 6 (11) ◽  
pp. 3562-3566
Author(s):  
W. S. Choi ◽  
J. H. Jang ◽  
B.-A. Yu ◽  
Y. L. Lee ◽  
W. Zhao ◽  
...  

Low loss high mesa optical waveguides were fabricated on InGaAsP/InP heterostructures by utilizing inductively-coupled-plasma reactive ion etching (ICP-RIE) and electron beam lithography technique. The fabrication process was optimized by measuring sidewall roughness of deep-etched waveguides. Atomic force microscope loaded with carbon nanotude was used to obtain three-dimensional image of the etched sidewall of waveguides. The obtained statistical information such as rms roughness and correlation length was used to theoretically calculate scattering loss of waveguides. Several waveguides with different number of sharp bends and the length were fabricated and their propagation losses were measured by modified Fabry-Perot method. The measured propagation losses were compared with theoretically calculated losses.


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