Influence of a drain field plate on the forward blocking characteristics of an AlGaN/GaN high electron mobility transistor

2013 ◽  
Vol 22 (11) ◽  
pp. 117307 ◽  
Author(s):  
Sheng-Lei Zhao ◽  
Wei-Wei Chen ◽  
Tong Yue ◽  
Yi Wang ◽  
Jun Luo ◽  
...  
2018 ◽  
Vol 8 (6) ◽  
pp. 974 ◽  
Author(s):  
Hyeon-Tak Kwak ◽  
Seung-Bo Chang ◽  
Hyun-Jung Kim ◽  
Kyu-Won Jang ◽  
Hyung Yoon ◽  
...  

2012 ◽  
Vol 529 ◽  
pp. 33-36
Author(s):  
Qian Luo ◽  
Jiang Feng Du ◽  
Xiang Wang ◽  
Ning Ning ◽  
Yang Liu ◽  
...  

An analytical model for field-plate (FP) optimization in high electron mobility transistor (HEMT) is reported. With the potential distribution in device’s channel being modeled in terms of physical parameters, the two critical parameters of FP, i.e., the insulator thickness and the FP length, are optimized respectively. Using the model, the optimization of the FP structure in a typical undoped AlGaN/GaN HEMT is described in detail.


Author(s):  
Kourdi Zakarya ◽  
Abdelkhader Hamdoun

We present this work by two steps. In the first one, the new structure proposed of the FP-HEMTs device (Field plate High Electron Mobility Transistor) with a T-gate on an 4H-SIC substrate to optimize these electrical performances, multiple field-plates were used with aluminum oxide to split the single electric field peak into several smaller peaks, and as passivation works to reduce scaling leakage current. In the next, we include a modeling of a simulation in the Tcad-Silvaco Software for realizing the study of the influence of negative voltage applied to gate T-shaped in OFF state time and high power with ambient temperature, the performance differences between the 3FP and the SFP devices are discussed in detail.


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