scholarly journals Formation of catalytic and corrosion protective layers with use of ion beam assisted deposition of metals from vacuum arc discharge plasma

2021 ◽  
Vol 2064 (1) ◽  
pp. 012054
Author(s):  
V V Poplavsky ◽  
A V Dorozhko ◽  
V G Matys
Keyword(s):  
Discharge Plasma ◽  
Arc Discharge ◽  
Ion Beam ◽  
Substrate Surface ◽  
Ion Source ◽  
Vacuum Arc ◽  
Corrosion Properties ◽  
Ion Beam Assisted Deposition ◽  
Deposited Metal ◽  
Catalytically Active

Abstract This paper presents a brief overview of our studies on the modification of materials using ion beam assisted deposition (IBAD) of metals from vacuum arc discharge plasma in order to form catalytically active and corrosion-resistant layers on the surface. Deposition of metals on different materials with simultaneous mixing of the deposited layer with the substrate surface by accelerated ions of the deposited metal was carried out in an experimental setup with a pulsed electric arc ion source. Catalytic and corrosion properties of the materials with the obtained layers were studied using electrochemical voltammetric measurements. The microstructure and composition of the resulting layers were studied using the SEM, EDX, WD-XRF, XPS, EBSD, and RBS methods.

scholarly journals Generation of a Metal Ion Beam Using a Vacuum Magnetron Discharge

Plasma ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 222-229
Author(s):  
Alexey V. Vizir ◽  
Efim M. Oks ◽  
Maxim V. Shandrikov ◽  
Georgy Yu. Yushkov
Keyword(s):  
Metal Ion ◽  
Arc Discharge ◽  
Ion Beam ◽  
Target Material ◽  
Ion Source ◽  
Vacuum Arc ◽  
Residual Pressure ◽  
Collector Current ◽  
Magnetron Discharge ◽  
Singly Charged

We have designed, fabricated and characterized an ion source based on a vacuum magnetron discharge. The magnetron discharge is initiated by a vacuum arc discharge, the plasma of which flows onto the magnetron sputtering target working surface. The vacuum arc material is usually the same as that of the magnetron target. The discharges operate at a residual pressure of 3 × 10−6 Torr without working gas feed. Pulses of vacuum arc (30 μs) and magnetron discharge (up to 300 μs) are applied simultaneously. After ignition by the vacuum arc, the magnetron discharge runs in a self-sustained mode. Cu–Cu, Ag–Ag, Zn–Zn, and Pb–Pb pairs of magnetron target material and vacuum arc cathode material were tested, as well as mixed pairs; for example, Cu vacuum arc cathode and Pb magnetron target. An ion beam was extracted from the discharge plasma by applying an accelerating voltage of up to 20 kV between the plasma expander and grounded electrodes. The ion beam collector current reached 80 mA. The ion beam composition, analyzed by a time-of-flight spectrometer, shows that the beam consists mainly of singly-charged (about 90%) and doubly-charged (about 10% current fraction) magnetron target material ions. The ion beam radial current density non-uniformity was as low as ±5% over a diameter of 6.6 cm, which is the diameter of the source output aperture.

Preparation and characterization of thin films of carbon nitride

1995 ◽  
Vol 53 ◽  
pp. 104-105
Author(s):  
L. Wan ◽  
R. F. Egerton
Keyword(s):  
Carbon Nitride ◽  
Arc Discharge ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Reactive Sputtering ◽  
Vacuum Arc ◽  
Specimen Preparation ◽  
Bonding Structure ◽  
Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

scholarly journals Вольт-амперные характеристики начальной стадии дугового разряда в высоковольтном вакуумном диоде

2019 ◽  
Vol 45 (12) ◽  
pp. 33
Author(s):  
С.Г. Давыдов ◽  
А.Н. Долгов ◽  
А.В. Корнеев ◽  
Р.Х. Якубов
Keyword(s):  
Electron Beam ◽  
High Voltage ◽  
Arc Discharge ◽  
Ion Beam ◽  
Vacuum Diode ◽  
Vacuum Arc ◽  
Ion Acceleration ◽  
Plasma Cloud ◽  
Initial Stage ◽  
Instability Development

AbstractThe process of electron instability development and propagation of a cathode electron beam and anomalous ion beam, followed by outburst of current in the initial stage of arc discharge was observed in rarefied plasma cloud of high-voltage vacuum diode. These events are consistent with the model of anomalous ion acceleration in interelectrode plasma at the spark stage of vacuum arc discharge.

scholarly journals Research and development of anti-adhesive coatings deposited by vacuum-arc discharge plasma

2018 ◽  
Vol 1115 ◽  
pp. 032049
Author(s):  
A Pesin ◽  
D Pustovoytov ◽  
R Vafin ◽  
E L Vardanyan ◽  
A Asylbaev ◽  
...  
Keyword(s):  
Research And Development ◽  
Discharge Plasma ◽  
Arc Discharge ◽  
Vacuum Arc

Corrosion properties of alumina coatings on steel and aluminum deposited by ion beam assisted deposition

1998 ◽  
Vol 98 (1-3) ◽  
pp. 997-1001 ◽  
Author(s):  
F. Stippich ◽  
E. Vera ◽  
H. Scheerer ◽  
G.K. Wolf ◽  
Xue Jian-Ming
Keyword(s):  
Ion Beam ◽  
Alumina Coatings ◽  
Corrosion Properties ◽  
Ion Beam Assisted Deposition
Sign in / Sign up

Export Citation Format

Share Document