scholarly journals Вольт-амперные характеристики начальной стадии дугового разряда в высоковольтном вакуумном диоде

2019 ◽  
Vol 45 (12) ◽  
pp. 33
Author(s):  
С.Г. Давыдов ◽  
А.Н. Долгов ◽  
А.В. Корнеев ◽  
Р.Х. Якубов
Keyword(s):  
Electron Beam ◽  
High Voltage ◽  
Arc Discharge ◽  
Ion Beam ◽  
Vacuum Diode ◽  
Vacuum Arc ◽  
Ion Acceleration ◽  
Plasma Cloud ◽  
Initial Stage ◽  
Instability Development

AbstractThe process of electron instability development and propagation of a cathode electron beam and anomalous ion beam, followed by outburst of current in the initial stage of arc discharge was observed in rarefied plasma cloud of high-voltage vacuum diode. These events are consistent with the model of anomalous ion acceleration in interelectrode plasma at the spark stage of vacuum arc discharge.

Current–Voltage Characteristics of the Initial Stage of Arc Discharge in a High-Voltage Vacuum Diode

2019 ◽  
Vol 45 (6) ◽  
pp. 616-619
Author(s):  
S. G. Davydov ◽  
A. N. Dolgov ◽  
A. V. Korneev ◽  
R. Kh. Yakubov
Keyword(s):  
High Voltage ◽  
Arc Discharge ◽  
Vacuum Diode ◽  
Initial Stage ◽  
Current Voltage ◽  
Current Voltage Characteristics

Preparation and characterization of thin films of carbon nitride

1995 ◽  
Vol 53 ◽  
pp. 104-105
Author(s):  
L. Wan ◽  
R. F. Egerton
Keyword(s):  
Carbon Nitride ◽  
Arc Discharge ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Reactive Sputtering ◽  
Vacuum Arc ◽  
Specimen Preparation ◽  
Bonding Structure ◽  
Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

scholarly journals Detection of oscillatory solutions in a vacuum diode with total electron reflection

2021 ◽  
Vol 2103 (1) ◽  
pp. 012205
Author(s):  
V I Kuznetsov ◽  
IK Morozov
Keyword(s):  
Electron Beam ◽  
Electric Field ◽  
Vacuum Diode ◽  
Boundary Line ◽  
Electrode Gap ◽  
Oscillatory Solutions ◽  
Total Electron ◽  
Electron Reflection ◽  
Instability Development ◽  
Non Linear

Abstract Stability features of steady-state solutions for a vacuum diode with complete deceleration of electron beam is studied. A boundary line on the (inter-electrode gap, external voltage)-plane separating stable solutions from unstable ones is built up. An instability development is shown to end in a state with non-linear oscillations of the electric field but with no virtual cathode in a plasma. Existence of non-linear oscillations of the electric field in a vacuum diode with total reflection of an electron beam points out that such a diode can be a basis to create microwave generator.

On a mechanism of ion acceleration in vacuum arc-discharge plasma

2001 ◽  
Vol 46 (5) ◽  
pp. 307-309 ◽  
Author(s):  
G. Yu. Yushkov ◽  
A. S. Bugaev ◽  
I. A. Krinberg ◽  
E. M. Oks
Keyword(s):  
Discharge Plasma ◽  
Arc Discharge ◽  
Vacuum Arc ◽  
Ion Acceleration

scholarly journals Formation of catalytic and corrosion protective layers with use of ion beam assisted deposition of metals from vacuum arc discharge plasma

2021 ◽  
Vol 2064 (1) ◽  
pp. 012054
Author(s):  
V V Poplavsky ◽  
A V Dorozhko ◽  
V G Matys
Keyword(s):  
Discharge Plasma ◽  
Arc Discharge ◽  
Ion Beam ◽  
Substrate Surface ◽  
Ion Source ◽  
Vacuum Arc ◽  
Corrosion Properties ◽  
Ion Beam Assisted Deposition ◽  
Deposited Metal ◽  
Catalytically Active

Abstract This paper presents a brief overview of our studies on the modification of materials using ion beam assisted deposition (IBAD) of metals from vacuum arc discharge plasma in order to form catalytically active and corrosion-resistant layers on the surface. Deposition of metals on different materials with simultaneous mixing of the deposited layer with the substrate surface by accelerated ions of the deposited metal was carried out in an experimental setup with a pulsed electric arc ion source. Catalytic and corrosion properties of the materials with the obtained layers were studied using electrochemical voltammetric measurements. The microstructure and composition of the resulting layers were studied using the SEM, EDX, WD-XRF, XPS, EBSD, and RBS methods.

scholarly journals Deuterium ion beam formation in a vacuum arc discharge system with a deuterated cathode

2019 ◽  
Vol 1393 ◽  
pp. 012050
Author(s):  
A G Nikolaev ◽  
V P Frolova ◽  
E M Oks ◽  
K P Savkin ◽  
M V Shandrikov ◽  
...  
Keyword(s):  
Arc Discharge ◽  
Ion Beam ◽  
Vacuum Arc ◽  
Discharge System ◽  
Beam Formation
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