scholarly journals Theoretical aspects of direct conversion of radio-chemical energy in electric by radiation-stimulated SiC*/Si heterostructure

2022 ◽  
Vol 2155 (1) ◽  
pp. 012014
Author(s):  
A V Gurskaya ◽  
V I Chepurnov ◽  
M V Dolgopolov ◽  
G V Puzyrnaya ◽  
I A Petenko

Abstract The authors consider their own CVD technology for the SiC growing on a Si substrate in order to create a beta converter. Since the beta converter contains a heavy C-14 atom, the finished beta converter works as an ”inner sun”, and the structure has specific mark * in the name: SiC*/Si. Authors focus on the problems of the theoretical description of: 1) the growth of the SiC*/Si film (with C-14 atoms inside) and the position of the p-n junction in the doping process; 2) method of a placement radioisotopes into a semiconductor material; 3) physical properties of radioisotopes; 4) defects formation; 5) generation of secondary electrons in the region of the p-n junction.

2019 ◽  
Vol 55 (6) ◽  
pp. 678-685
Author(s):  
V. Yu. Barinov ◽  
D. Yu. Kovalev ◽  
S. G. Vadchenko ◽  
O. A. Golosova ◽  
V. V. Prosyanyuk ◽  
...  

2010 ◽  
Vol 1256 ◽  
Author(s):  
Avi Shalav ◽  
Robert Elliman ◽  
Taehyun Kim

AbstractSiOx nanowires can be grown via the vapor-liquid-solid growth mechanism using SiO vapor produced during the active oxidation of a Si substrate. The as-grown SiOx nanowire have a range of useful physical properties but can also be used as large surface area substrates for the growth of secondary materials. In this study we report the use of optically active impurities to grow and dope secondary nanowire structures, and the use of simple coating methods to enhance and extend the functionality of these unique nanowire substrates.


2019 ◽  
Vol 522 ◽  
pp. 110-116 ◽  
Author(s):  
Xiaokang Yao ◽  
Can Wang ◽  
Shilu Tian ◽  
Yong Zhou ◽  
Xiaomei Li ◽  
...  

2017 ◽  
Vol 4 (8) ◽  
pp. 086414 ◽  
Author(s):  
Kian Heng Goh ◽  
Hui Jing Lee ◽  
Sze Kuan Lau ◽  
Pei Chiew Teh ◽  
S Ramesh ◽  
...  

2020 ◽  
Vol 509 ◽  
pp. 144903
Author(s):  
Chunmei Tang ◽  
Fei Sun ◽  
Zoufei Chen ◽  
Hongya Yu ◽  
Deyang Chen ◽  
...  

2015 ◽  
Vol 478 (1) ◽  
pp. 54-59 ◽  
Author(s):  
Huan Liao ◽  
Qiong Yang ◽  
Yichun Zhou ◽  
Yi Zhang ◽  
Limei Jiang

Author(s):  
A. Muray ◽  
M. Isaacson ◽  
E. Kirkland

Previously, calculations of the resolution of SEM secondary electron images due to the escape depth of these electrons utilized Monte-Carlo calculations to simulate the “edge brightness effects” seen in high resolution magnification images obtained with small probe sizes (e.g.,). Similar Monte-Carlo calculations have been made to try to deduce the energy dissipation profiles in PMMA due to secondary electrons. We are trying to develop a simple analytical model which might allow us to get a better feel for the salient features with which the secondary electrons limit the pattern size in microfabrication and spatial resolution in the SEM.For our initial measurements, we have fabricated the structure shown in figure 1. The thickness of both the PMMA and Si substrate are less than one mean free path for inelastic scattering (of 100 keV electrons) thick. A 10 Å diameter beam of convergence angle of 15 mrad is incident normal to the sample surface.


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