Effect of dilution gas on hardness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure plasma enhanced CVD

Journal of Physics Conference Series ◽

10.1088/1742-6596/417/1/012044 ◽

2013 ◽

Vol 417 ◽

pp. 012044 ◽

Author(s):

M Noborisaka ◽

Y Tachimoto ◽

R Horikoshi ◽

A Shirakura ◽

T Suzuki

Keyword(s):

Amorphous Carbon ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Hydrogenated Amorphous Carbon ◽

Plasma Enhanced Cvd ◽

Pressure Plasma ◽

Hydrogenated Amorphous ◽

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Growth process of hydrogenated amorphous carbon films synthesized by atmospheric pressure plasma enhanced CVD using nitrogen and helium as a dilution gas

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.045503 ◽

2016 ◽

Vol 55 (4) ◽

pp. 045503 ◽

Author(s):

Takanori Mori ◽

Takachika Sakurai ◽

Taiki Sato ◽

Akira Shirakura ◽

Tetsuya Suzuki

Keyword(s):

Amorphous Carbon ◽

Atmospheric Pressure ◽

Growth Process ◽

Atmospheric Pressure Plasma ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Plasma Enhanced Cvd ◽

Pressure Plasma ◽

Hydrogenated Amorphous

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Hardness and surface roughness of hydrogenated amorphous carbon films synthesized by atmospheric pressure plasma enhanced CVD method with various pulse frequencies

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.09.058 ◽

2013 ◽

Vol 215 ◽

pp. 460-464 ◽

Author(s):

T. Sakurai ◽

M. Noborisaka ◽

T. Hirako ◽

A. Shirakura ◽

T. Suzuki

Keyword(s):

Surface Roughness ◽

Amorphous Carbon ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Plasma Enhanced Cvd ◽

Pressure Plasma ◽

Hydrogenated Amorphous

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Synthesis of hydrogenated amorphous carbon films with a line type atmospheric-pressure plasma CVD apparatus

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2011.10.002 ◽

2011 ◽

Vol 206 (7) ◽

pp. 2025-2029 ◽

Author(s):

Masaki Agemi ◽

Kotaro Kayama ◽

Mayui Noborisaka ◽

Yohei Tachimoto ◽

Akira Shirakura ◽

...

Keyword(s):

Amorphous Carbon ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Pressure Plasma ◽

Hydrogenated Amorphous ◽

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Hardness and surface roughness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure-plasma enhanced chemical vapor deposition at low temperature

Thin Solid Films ◽

10.1016/j.tsf.2012.11.065 ◽

2013 ◽

Vol 527 ◽

pp. 114-119 ◽

Author(s):

Mayui Noborisaka ◽

Ryohei Horikoshi ◽

So Nagashima ◽

Akira Shirakura ◽

Tetsuya Suzuki

Keyword(s):

Surface Roughness ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Pressure Plasma ◽

Hydrogenated Amorphous

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Photovoltaic characteristics of boron-doped hydrogenated amorphous carbon on n-Si substrate prepared by r.f. plasma-enhanced CVD using trimethylboron

Diamond and Related Materials ◽

10.1016/s0925-9635(03)00031-1 ◽

2003 ◽

Vol 12 (3-7) ◽

pp. 687-690 ◽

Author(s):

Y. Hayashi ◽

S. Ishikawa ◽

T. Soga ◽

M. Umeno ◽

T. Jimbo

Keyword(s):

Amorphous Carbon ◽

Si Substrate ◽

Hydrogenated Amorphous Carbon ◽

Plasma Enhanced Cvd ◽

Boron Doped ◽

Photovoltaic Characteristics ◽

Hydrogenated Amorphous

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Atmospheric–pressure Plasma–enhanced CVD of Hybrid Silica Membranes at Ambient Temperature and Pressure

MEMBRANE ◽

10.5360/membrane.44.10 ◽

2019 ◽

Vol 44 (1) ◽

pp. 10-15

Author(s):

Hiroki Nagasawa

Keyword(s):

Ambient Temperature ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Silica Membranes ◽

Plasma Enhanced Cvd ◽

Pressure Plasma ◽

Hybrid Silica ◽

Temperature And Pressure

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Effect of C2H4/N2 Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H)

Plasma Chemistry and Plasma Processing ◽

10.1007/s11090-010-9214-y ◽

2010 ◽

Vol 30 (2) ◽

pp. 213-239 ◽

Author(s):

Christian Sarra-Bournet ◽

Nicolas Gherardi ◽

Hervé Glénat ◽

Gaétan Laroche ◽

Francoise Massines

Keyword(s):

Dielectric Barrier Discharge ◽

Amorphous Carbon ◽

Atmospheric Pressure ◽

Carbon Nitride ◽

Barrier Discharge ◽

Plasma Deposition ◽

Dielectric Barrier ◽

Hydrogenated Amorphous Carbon ◽

Amorphous Carbon Nitride ◽

Hydrogenated Amorphous

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Atmospheric Pressure Plasma Enhanced CVD of Fe Nanoparticles

ECS Transactions ◽

10.1149/1.3207690 ◽

2019 ◽

Vol 25 (8) ◽

pp. 943-951 ◽

Author(s):

Sergei Alexandrov ◽

Irina Kretusheva ◽

Maxim V. Mishin

Keyword(s):

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Plasma Enhanced Cvd ◽

Pressure Plasma ◽

Fe Nanoparticles

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Atmospheric Pressure Plasma-Enhanced CVD for Surface Modification: Principles and Applications

Advances in Science and Technology ◽

10.4028/www.scientific.net/ast.45.1173 ◽

2006 ◽

Vol 45 ◽

pp. 1173-1177 ◽

Author(s):

Michael L. Hitchman ◽

Sergei E. Alexandrov

Keyword(s):

Surface Modification ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Dielectric Barrier Discharges ◽

Thermal Nonequilibrium ◽

Dielectric Barrier ◽

Nonequilibrium Plasmas ◽

Plasma Enhanced Cvd ◽

Pressure Plasma ◽

Barrier Discharges

This review gives an overview of the characteristics of various non-thermal, nonequilibrium plasmas and outlines results of AP-PECVD with dielectric barrier discharges.

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The deposition of copper-based thin films via atmospheric pressure plasma-enhanced CVD

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2013.06.053 ◽

2013 ◽

Vol 230 ◽

pp. 260-265 ◽

Author(s):

John L. Hodgkinson ◽

David Massey ◽

David W. Sheel

Keyword(s):

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Plasma Enhanced Cvd ◽

Pressure Plasma

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