Interband Semiconductor Lasers and LEDs

Author(s):  
Vurgaftman Igor

This chapter discusses the operation of conventional diode lasers based on quantum wells and quantum dots as a function of emission wavelength. The recombination processes that control the threshold current density of the devices are described in detail, including recombination at defects, radiative, and Auger recombination. The high-speed modulation and spectral characteristics of semiconductor lasers are also discussed. It continues by illustrating why interband cascade lasers can outperform diode lasers at mid-infrared wavelengths and describing their design and operating characteristics in detail. On the short-wavelength side of the spectrum, the nitride lasers and the factors that limit their performance are discussed. In addition to lasers, the principles underlying light-emitting diodes (LEDs) are outlined, and the proposed mechanisms for improving the extraction of the light from high-index semiconductor materials are described. The chapter concludes with a discussion of the performance of semiconductor optical amplifiers designed to amplify a weak input signal.

2001 ◽  
Vol 692 ◽  
Author(s):  
C. Mermelstein ◽  
M. Rattunde ◽  
J. Schmitz ◽  
S. Simanowski ◽  
R. Kiefer ◽  
...  

AbstractIn this paper we review recent progress achieved in our development of type-I GaInAsSb/AlGaAsSb quantum-well (QW) lasers with emission wavelength in the 1.74–2.34 μm range. Triple-QW (3-QW) and single-QW (SQW) diode lasers having broadened waveguide design emitting around 2.26 μm have been studied in particular. Comparing the two designs we have find that the threshold current density at infinite cavity length as well as the transparency current density scale with the number of QWs. Maximum cw operating temperature exceeding 50°C and 90°C has been obtained for ridge waveguide lasers emitting above and below 2 μm, respectively. Ridge waveguide diode lasers emitting at 1.94 μm exhibited internal quantum efficiencies in excess of 77%, internal losses of 6 cm−1, and threshold current density at infinite cavity length as low as 121 A/cm2 reflecting the superior quality of our diode lasers, all values recorded at 280 K. A high characteristic temperature TOof 179 K for the threshold current along with a value of T1 = 433 K for the characteristic temperature of the external efficiency have been attained for the 240–280 K temperature interval. Room temperature cw output powers exceeding 1.7 W have been demonstrated for broad area single element devices with highreflection/ antireflection coated mirror facets, mounted epi-side down. The latter result is a proof for the high power capabilities of these GaSb-based mid-ir diode lasers.


1989 ◽  
Vol 1 (8) ◽  
pp. 205-208 ◽  
Author(s):  
D. Botez ◽  
L.M. Zinkiewicz ◽  
T.J. Roth ◽  
L.J. Mawst ◽  
G. Peterson

2012 ◽  
Vol 46 (9) ◽  
pp. 1211-1215 ◽  
Author(s):  
I. S. Shashkin ◽  
D. A. Vinokurov ◽  
A. V. Lyutetskiy ◽  
D. N. Nikolaev ◽  
N. A. Pikhtin ◽  
...  

1992 ◽  
Vol 70 (10-11) ◽  
pp. 1057-1063 ◽  
Author(s):  
Chung Y. Wu ◽  
Chang Z. Guo ◽  
J. M. Xu

The electron temperature in the active layers of a semiconductor laser can be raised higher than that of the lattice by an externally applied microwave field. This results in a reduction in the optical gain and forms the basis of laser modulation by microwave heating. The gain variation under electron gas heating is calculated. A complete small signal analysis of current modulation, electron heating modulation, and combined or microwave-assisted modulation of semiconductor lasers is presented. In addition, the sensitivities of the electron and photon responses among the three modulation schemes are compared. Some large signal simulation results of high-speed digital modulation are also included.


1995 ◽  
Vol 392 ◽  
Author(s):  
T Taskin ◽  
Q Huda ◽  
A Scholes ◽  
J H Evans ◽  
A R Peaker ◽  
...  

AbstractThis paper reports a study of the non-radiative processes competing with the excitation of the erbium ion in layers implanted with high concentrations of erbium and oxygen. These processes reduce the luminescence efficiency of the Si:Er system and dramatically increase the threshold current density calculated to be necessary for an ultimate goal, the Si/Ge:Er LASER. Using cross sectional TEM, photoluminescence as a function of temperature and DLTS, it is demonstrated that a two stage anneal procedure which avoids the formation of extended defects and removes specific deep states is necessary to obtain efficient Er3+ excitation at high erbium concentrations. Comparisons are made with damage resulting from germanium implantation into silicon. The role of multiple stage anneals is discussed in relation to the removal of Shockley-Hall-Read recombination centres


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