Evaluation of diffusion mechanisms in NiAl by embedded-atom and first-principles calculations

2003 ◽  
Vol 67 (1) ◽  
Author(s):  
Y. Mishin ◽  
A. Y. Lozovoi ◽  
A. Alavi
2010 ◽  
Vol 1264 ◽  
Author(s):  
Guido Roma

AbstractThe basic properties of palladium impurities in silicon carbide, such as solubility or diffusion mechanisms, are far from being well understood. In a recent paper I presented a systematic study of stability and kinetic properties of Pd in cubic silicon carbide using first principles calculations. In this paper I focus on the effect of the presence of palladium in silicon carbide, even in very low concentrations, on the kinetic properties of carbon vacancies. I apply a odel of Pd diffusion through a vacancy mechanism on the carbon sublattice and extract the correlation factors leading to an enhancement of vacancy migration, due to the coupling of iffusion fluxes between vacancies and palladium impurities.


2007 ◽  
Vol 1056 ◽  
Author(s):  
Y. Purohit ◽  
D. L. Irving ◽  
R. O. Scattergood ◽  
D. W. Brenner

ABSTRACTEnergies for symmetric tilt grain boundaries in pure Al and in Al with substitutional Pb defects at coincident sites along the grain boundaries were calculated using a modified embedded atom method potential and density functional theory. The agreement between the analytic potential, the first principles calculations and experiment is reasonably good for the pure system. For the Al-Pb system both the analytic potential and first principles calculations predict that Pb segregation to the interface is energetically preferred compared to the dilute solution. The application of a disclination structural unit model to calculating grain boundary energies over the entire range of tilt angles is also explained.


2015 ◽  
Vol 29 (19) ◽  
pp. 1550130
Author(s):  
Li An Chen ◽  
Xing Feng Zhu ◽  
Ling Fu Chen

The diffusion is of great significance in many applications when the impurities are employed to tune the semiconductor's electrical or optical properties. It is necessary to understand how dopant defects diffuse in semiconductors. Using first-principles calculations, we consider interstitial diffusion mechanisms and calculate the migration barrier energies of interstitial Cu, Ag and Au atoms in II–VI compounds ZnTe. We find that the relative size of dopant and bulk atoms is an important factor which affects the diffusion behavior. The high symmetry Tc site, which is tetrahedrally coordinated by four cation atoms, is the global minimum energy location for Ag and Au interstitials. The size of Cu adatom is small, so Cu is more stable when it locates at the Ta site which is tetrahedrally coordinated by four anion atoms. But the global minimum energy location for Cu interstitials is M site which is of smaller space than Ta. Cu adatoms show an asymmetric curve of energy diffusion barrier with two energetically distinct extremum in the pathway. Ag diffuses along nearly straight line paths along [111] or equivalent directions. Diffusion for Cu or Au deviates from the straight line paths along 〈111〉 avoiding high symmetric sites.


2013 ◽  
Vol 27 (19) ◽  
pp. 1341034
Author(s):  
ZHI-SHENG NONG ◽  
JING-CHUAN ZHU ◽  
YONG CAO ◽  
XIA-WEI YANG ◽  
ZHONG-HONG LAI ◽  
...  

The self-diffusion process in B2 type intermetallic compound AlCo has been investigated by the first-principles calculations within the frame work of density functional theory (DFT). The obtained mono-vacancy formation, migration and activation energies for four self-diffusion mechanisms, the next-nearest-neighbor (NNN) jump, [110] six-jump cycle (6JC), straight [100] 6JC and bent [100] 6JC diffusion show that the NNN jump mechanism of Co vacancy requires the lowest activation energy (Q = 6.835 eV ) in these diffusion mechanisms, which indicates that it is the main way of self-diffusion in AlCo . The electronic structure including the electron density difference on (-1 1 0) plane as well as atomic Mulliken populations were calculated, and the change of bonding behavior during the [110] 6JC process was discussed in detail. Finally, the self-diffusion coefficients of NNN jump and 6JC mechanisms for AlCo were also studied via the first-principles calculations and semi-empirical predictions, which indicates that the self-diffusion coefficients for NNN jump of Co vacancy show the highest value than the others.


2015 ◽  
Vol 29 (11) ◽  
pp. 1550044
Author(s):  
Li An Chen ◽  
En Hai Jiang ◽  
Xing Feng Zhu ◽  
Ling Fu Chen

The diffusion plays an important role in many applications when the impurities are employed to tune the semiconductor's electrical or optical properties, which make it essential to understand theoretically the microscopic mechanisms governing how dopant defects diffuse. Using first-principles calculations, we compare the diffusion behaviors and migration barriers of interstitial Cu , Ag , and Au atoms in II–VI compounds ZnSe . We consider interstitial diffusion mechanisms and calculate the corresponding activation energies. For noble atoms, we find that the interstitial mediated mechanism is the dominant one. We also find that the relative size of dopant atoms and constituent atoms of II–VI compounds is an important factor affecting the diffusion behaviors. The coupling in ZnSe between Cu d levels and unoccupied host s levels is not as strong as that in CdTe .


2014 ◽  
Vol 183 ◽  
pp. 60-63 ◽  
Author(s):  
Yu-Fei Wang ◽  
Hai-Yan Gao ◽  
Jun Wang ◽  
Yan-Feng Han ◽  
Yong-Bing Dai ◽  
...  

2011 ◽  
Vol 19 (7) ◽  
pp. 1036-1040 ◽  
Author(s):  
Guoliang Zhu ◽  
Yongbing Dai ◽  
Da Shu ◽  
Yanping Xiao ◽  
Yongxiang Yang ◽  
...  

2011 ◽  
Vol 320 ◽  
pp. 415-420 ◽  
Author(s):  
Chuan Hui Zhang ◽  
Jia Jia Han ◽  
Shuo Huang ◽  
Jiang Shen

We explored a new type EAM potential (CLI-EAM) that the value of atomic electron density and pair potential functions are obtained by Chen’s lattice inversion based on first-principles calculations. This EAM potential is applied to Cu, Ag, Cu and Pt metals successfully and the results of basic properties agreed with the experiments. For the same metal, the cohesive energy of fcc structures are the lower than bcc structures.


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