Radial spatiotemporal evolution of rf magnetic field and plasma current in a very-high-frequency plasma source over a wide range of plasma density and pressure

2021 ◽  
Vol 104 (2) ◽  
Author(s):  
Jianping Zhao ◽  
Peter L. G. Ventzek ◽  
Barton Lane ◽  
Toshihiko Iwao ◽  
Kiyotaka Ishibashi
Keyword(s):  
High Frequency ◽  
Plasma Source ◽  
Plasma Current ◽  
Spatiotemporal Evolution ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Wide Range ◽  
Rf Magnetic Field ◽  
Very High

Dual comb-type electrodes as a plasma source for very high frequency plasma enhanced chemical vapor deposition

2010 ◽  
Vol 518 (8) ◽  
pp. 2124-2127 ◽  
Author(s):  
Doo Sup Hwang ◽  
Seung Yoon Lee ◽  
Heon Min Lee ◽  
Sang Jin Kim ◽  
Gil Jun Kim
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Plasma Source ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Characteristics of Very High Frequency Plasma Produced Using a Ladder-Shaped Electrode

1999 ◽  
Vol 38 (Part 1, No. 7B) ◽  
pp. 4305-4308 ◽  
Author(s):  
Hiroshi Mashima ◽  
Masayoshi Murata ◽  
Yoshiaki Takeuchi ◽  
Hideo Yamakoshi ◽  
Tatsuji Horioka ◽  
...  
Keyword(s):  
High Frequency ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High
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