Transmission multilayer polarizers for use in the 55–90 eV region

1998 ◽  
Vol 5 (3) ◽  
pp. 732-734 ◽  
Author(s):  
Weibing Hu ◽  
Tadashi Hatano ◽  
Masaki Yamamoto ◽  
Makoto Watanabe
Keyword(s):  
Synchrotron Radiation ◽  
Photon Energy ◽  
Degree Of Polarization ◽  
Free Standing ◽  
Unpolarized Light

Free-standing Al/YB6 and Mo/Si transmission multilayer polarizers have been developed for use in the photon energy regions 55–72 eV and 72–90 eV, respectively, to improve the degree of polarization of synchrotron radiation light from beamline monochromators. The polarizance (polarizing ability) and transmittance of the Al/YB6 multilayer for unpolarized light at 64 eV were 77% and 3.4%, respectively, and the polarizance and transmittance of the Mo/Si multilayer at 80 eV were 79% and 2.2%, respectively. By using the Mo/Si polarizer, the degree of polarization of the monochromated light at BL8B1 of UVSOR was increased from 95 to 99% in the 78–84 eV region.

scholarly journals Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4–250 eV

2020 ◽  
Vol 27 (1) ◽  
pp. 75-82
Author(s):  
Mikhail Svechnikov ◽  
Nikolay Chkhalo ◽  
Alexey Lopatin ◽  
Roman Pleshkov ◽  
Vladimir Polkovnikov ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Synchrotron Radiation ◽  
Initial Data ◽  
Absorption Coefficient ◽  
Energy Range ◽  
Transmission Coefficient ◽  
Radiation Source ◽  
Optical Constants ◽  
Free Standing

In this work, the refractive index of beryllium in the photon energy range 20.4–250 eV was experimentally determined. The initial data include measurements of the transmittance of two free-standing Be films with thicknesses of 70 nm and 152 nm, as well as reflectometric measurements of similar films on a substrate. Measurements were carried out at the optics beamline of the BESSY II synchrotron radiation source. The absorption coefficient β was found directly from the transmission coefficient of the films, and the real part of the polarizability δ was calculated from the Kramers–Kronig relations. A comparison is carried out with results obtained 20 years ago at the ALS synchrotron using a similar methodology.

scholarly journals Challenges in a Hybrid Fabrication Process to Generate Metallic Polarization Elements with Sub-Wavelength Dimensions

Materials ◽  
2020 ◽  
Vol 13 (22) ◽  
pp. 5279
Author(s):  
Stefan Belle ◽  
Babette Goetzendorfer ◽  
Ralf Hellmann
Keyword(s):  
Final Height ◽  
Three Dimensional ◽  
Fabrication Process ◽  
Degree Of Polarization ◽  
Direct Laser Writing ◽  
Free Standing ◽  
Laser Writing ◽  
Additive Fabrication ◽  
Direct Laser ◽  
Sub Wavelength

We report on the challenges in a hybrid sub-micrometer fabrication process while using three dimensional femtosecond direct laser writing and electroplating. With this hybrid subtractive and additive fabrication process, it is possible to generate metallic polarization elements with sub-wavelength dimensions of less than 400 nm in the cladding area. We show approaches for improving the adhesion of freestanding photoresist pillars as well as of the metallic cladding area, and we also demonstrate the avoidance of an inhibition layer and sticking of the freestanding pillars. Three-dimensional direct laser writing in a positive tone photoresist is used as a subtractive process to fabricate free-standing non-metallic photoresist pillars with an area of about 850 nm × 1400 nm, a height of 3000 nm, and a distance between the pillars of less than 400 nm. In a subsequent additive fabrication process, these channels are filled with gold by electrochemical deposition up to a final height of 2200 nm. Finally, the polarization elements are characterized by measuring the degree of polarization in order to show their behavior as quarter- and half-wave plates.

Photoionisationsmassenspektren von MethyI(trifluormethyl)sulfan CH3SCF3 [1]/Photoionization Mass Spectra of Methyl(trifluoromethyl)sulfan CH3SCF3 [1]

1989 ◽  
Vol 44 (1) ◽  
pp. 17-20 ◽  
Author(s):  
G. Hagenow ◽  
H.-W. Jochims ◽  
J. Sawatzki ◽  
R. Minkwitz ◽  
H. Baumgärtel
Keyword(s):  
Synchrotron Radiation ◽  
Energy Range ◽  
Ionization Potential ◽  
Photon Energy ◽  
Mass Spectra ◽  
Thermochemical Data ◽  
Photon Energy Range ◽  
Fragment Ions

Abstract The ionization potential of CH3SCF3 and the appearance potentials of fragment ions have been measured in the photon energy range 9 -19 eV using synchrotron, radiation. From these results thermochemical data of CH3SCF3, CH3SCF3+ and fragment ions have been evaluated.

Progress in Fixed-Photon-Energy Time-Efficient Double Imaging Photoelectron/Photoion Coincidence Measurements in Quantitative Flame Analysis

2016 ◽  
Vol 230 (8) ◽  
Author(s):  
Daniel Felsmann ◽  
Arnas Lucassen ◽  
Julia Krüger ◽  
Christian Hemken ◽  
Luc-Sy Tran ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Synchrotron Radiation ◽  
Photon Energy ◽  
Molecular Beam ◽  
Vacuum Ultraviolet ◽  
Photoelectron Spectra ◽  
Combustion Analysis ◽  
Molecular Beam Mass Spectrometry ◽  
Vuv Photoionization ◽  
Coincidence Measurements

AbstractPhotoelectron photoion coincidence (PEPICO) spectroscopy as an attractive new technique for combustion analysis was used in a fixed-photon-energy configuration to provide quantitative species profiles in laminar premixed flames. While such measurements are conventionally performed with molecular-beam mass spectrometry (MBMS) using electron ionization (EI) or vacuum ultraviolet (VUV) photoionization (PI) with synchrotron radiation, these techniques have some limitations. The possibility to record photoelectron spectra (PES) simultaneously with photoionization data, providing fingerprint information for reliable species identification, presents a significant advantage of PEPICO spectroscopy especially in complex reactive mixtures. The multiplex approach presented here, enhanced by the imaging capabilities of the electron and ion detection in the so-called double-imaging PEPICO scheme (i

Densification of Sio Gel Films by Synchrotron Radiation and its Dependence on Photon Energy

1994 ◽  
Vol 375 ◽  
Author(s):  
Hiroaki Imai ◽  
Koichi Awazu ◽  
Masaru Yasumori ◽  
Hiroshi Hirashima ◽  
Hideo Onuki
Keyword(s):  
Refractive Index ◽  
Infrared Spectroscopy ◽  
Synchrotron Radiation ◽  
Energy Dependence ◽  
Photon Energy ◽  
Oh Groups

AbstractThe interaction of synchrotron radiation (SR) emitted from a polarizing undulator with SiO2 gel films was investigated by ellipsometry and infrared spectroscopy. The photon energy in SR was varied in the range of 6.4−17.8 eV using an Onuki-type undulator in order to study the energy dependence of the interaction. We found that an increase of refractive index, a decrease of thickness of the films and a loss of OH groups were induced by photons with energies above ˜9 eV although any changes were not observed with photons below ˜7 eV. These results suggest that SiO2 gel films are densified through electronic processes stimulated by the energetic photons.

Performance of the BL03U beamline at SSRF

2020 ◽  
Vol 27 (5) ◽  
pp. 1388-1394
Author(s):  
Z. P. Sun ◽  
Z. H. Liu ◽  
Z. T. Liu ◽  
W. L. Liu ◽  
F. Y. Zhang ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Energy Range ◽  
Photon Energy ◽  
Vacuum Ultraviolet ◽  
Resolving Power ◽  
Photon Energy Range ◽  
Photoemission Spectroscopy ◽  
Theoretical Estimation ◽  
Shanghai Synchrotron Radiation Facility ◽  
Angle Resolved Photoemission Spectroscopy

The vacuum ultraviolet beamline BL03U with a photon energy range from 7 eV upwards has been constructed at the 3.5 GeV Shanghai Synchrotron Radiation Facility. Equipped with an APPLE-Knot undulator, this beamline is dedicated to angle-resolved photoemission spectroscopy. An energy-resolving power of higher than 4.6 × 104 has been achieved in the photon energy range 21.6–48 eV, which is almost the same as the theoretical estimation.

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