scholarly journals In situ high-temperature EXAFS measurements on radioactive and air-sensitive molten salt materials

2019 ◽  
Vol 26 (1) ◽  
pp. 124-136 ◽  
Author(s):  
Anna L. Smith ◽  
Malte N. Verleg ◽  
John Vlieland ◽  
Dick de Haas ◽  
Jaen A. Ocadiz-Flores ◽  
...  

The development at the Delft University of Technology (TU Delft, The Netherlands) of an experimental set-up dedicated to high-temperature in situ EXAFS measurements of radioactive, air-sensitive and corrosive fluoride salts is reported. A detailed description of the sample containment cell, of the furnace design, and of the measurement geometry allowing simultaneous transmission and fluorescence measurements is given herein. The performance of the equipment is tested with the room-temperature measurement of thorium tetrafluoride, and the Th—F and Th—Th bond distances obtained by fitting of the EXAFS data are compared with the ones extracted from a refinement of neutron diffraction data collected at the PEARL beamline at TU Delft. The adequacy of the sample confinement is checked with a mapping of the thorium concentration profile of molten salt material. Finally, a few selected salt mixtures (LiF:ThF4) = (0.9:0.1), (0.75:0.25), (0.5:0.5) and (NaF:ThF4) = (0.67:0.33), (0.5:0.5) are measured in the molten state. Qualitative trends along the series are discussed, and the experimental data for the (LiF:ThF4) = (0.5:0.5) composition are compared with the EXAFS spectrum generated from molecular dynamics simulations.

2004 ◽  
Vol 16 (6) ◽  
pp. 1153-1159 ◽  
Author(s):  
Margret J. Geselbracht ◽  
Liam D. Noailles ◽  
Lien T. Ngo ◽  
Jessica H. Pikul ◽  
Richard I. Walton ◽  
...  

ChemInform ◽  
2004 ◽  
Vol 35 (23) ◽  
Author(s):  
Margret J. Geselbracht ◽  
Liam D. Noailles ◽  
Lien T. Ngo ◽  
Jessica H. Pikul ◽  
Richard I. Walton ◽  
...  

2016 ◽  
Vol 52 (96) ◽  
pp. 13865-13868 ◽  
Author(s):  
Saul J. Moorhouse ◽  
Yue Wu ◽  
Hannah C. Buckley ◽  
Dermot O'Hare

We report the first use of high-energy monochromatic in situ X-ray powder diffraction to gain unprecedented insights into the chemical processes occurring during high temperature, lab-scale metal oxide syntheses.


Author(s):  
N. Rozhanski ◽  
A. Barg

Amorphous Ni-Nb alloys are of potential interest as diffusion barriers for high temperature metallization for VLSI. In the present work amorphous Ni-Nb films were sputter deposited on Si(100) and their interaction with a substrate was studied in the temperature range (200-700)°C. The crystallization of films was observed on the plan-view specimens heated in-situ in Philips-400ST microscope. Cross-sectional objects were prepared to study the structure of interfaces.The crystallization temperature of Ni5 0 Ni5 0 and Ni8 0 Nb2 0 films was found to be equal to 675°C and 525°C correspondingly. The crystallization of Ni5 0 Ni5 0 films is followed by the formation of Ni6Nb7 and Ni3Nb nucleus. Ni8 0Nb2 0 films crystallise with the formation of Ni and Ni3Nb crystals. No interaction of both films with Si substrate was observed on plan-view specimens up to 700°C, that is due to the barrier action of the native SiO2 layer.


RSC Advances ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 5507-5515
Author(s):  
Liang Song ◽  
Feng-Qi Zhao ◽  
Si-Yu Xu ◽  
Xue-Hai Ju

The bimolecular and fused ring compounds are found in the high-temperature pyrolysis of NONA using ReaxFF molecular dynamics simulations.


2021 ◽  
Vol 714 (3) ◽  
pp. 032008
Author(s):  
Hongmei Li ◽  
Zhisheng Nong ◽  
Qian Xu ◽  
Qiushi Song ◽  
Ying Chen ◽  
...  

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