Hemispherical grained Si formation on in-situ phosphorus doped amorphous-Si electrode for 256 Mb DRAM's capacitor

1995 ◽  
Vol 42 (7) ◽  
pp. 1247-1254 ◽  
Author(s):  
H. Watanabe ◽  
T. Tatsumi ◽  
S. Ohnishi ◽  
H. Kitajima ◽  
I. Honma ◽  
...  
1990 ◽  
Author(s):  
Takashi KOBAYASHI ◽  
Shinpei IIJIMA ◽  
Atsushi HIRAIWA

Author(s):  
Meric Firat ◽  
Hariharsudan Sivaramakrishnan Radhakrishnan ◽  
Maria Recaman Payo ◽  
Filip Duerinckx ◽  
Rajiv Sharma ◽  
...  

RSC Advances ◽  
2016 ◽  
Vol 6 (56) ◽  
pp. 51387-51393 ◽  
Author(s):  
Z. Vlčková Živcová ◽  
O. Frank ◽  
S. Drijkoningen ◽  
K. Haenen ◽  
V. Mortet ◽  
...  

Electrochemical and in situ Raman spectroelectrochemical characterization of n-type phosphorus-doped nanocrystalline diamond (P-NCD) is carried out.


1990 ◽  
Vol 201 ◽  
Author(s):  
James S. Im ◽  
Jung H. Shin ◽  
Harry A. Atwater

AbstractIn situ electron microscopy has been used to observe crystal nucleation and growth in amorphous Si films. Results demonstrate that a repeated intermediate temperature ion irradiation/thermal annealing cycle can lead to suppression of nucleation in amorphous regions without inhibition of crystal growth of existing large crystals. Fundamentally, the experimental results indicate that the population of small crystal clusters near the critical cluster size is affected by intermediate temperature ion irradiation. Potential applications of the intermediate temperature irradiation/thermal anneal cycle to lateral solid epitaxy of Si and thin film device technology are discussed.


2022 ◽  
Vol 236 ◽  
pp. 111544
Author(s):  
Meriç Fırat ◽  
Hariharsudan Sivaramakrishnan Radhakrishnan ◽  
María Recamán Payo ◽  
Patrick Choulat ◽  
Hussein Badran ◽  
...  

2019 ◽  
Vol 21 (31) ◽  
pp. 17356-17365 ◽  
Author(s):  
Katie L. Browning ◽  
James F. Browning ◽  
Mathieu Doucet ◽  
Norifumi L. Yamada ◽  
Gao Liu ◽  
...  

With the use of in situ neutron reflectometry (NR) we show how the addition of an electronically conductive polymeric binder, PEFM, mediates the solid–electrolyte interphase (SEI) formation and composition on an amorphous Si (a-Si) electrode as a function of the state-of-charge.


1989 ◽  
Vol 157 ◽  
Author(s):  
W. Marine ◽  
J. Marfaing

ABSTRACTThe structure and morphologies of the thin amorphous a-Si and oc-Ge films crystallized “in situ” in an electronic microscope by pulsed YAG laser have been studied using conventional and high-resolution transmission electronic microscopy observations. It is found that the laser induced nucleation rate (I) is laser pulse length dependent. I is about 1021-1022 cm−3 s−1 (α-Si) and 1023-1025 cm−3 s−1 (α-Ge) near the melting point. Explosive dendritic formation is the result of competition between solid state light induced nucleation and melting mediated explosive growth.


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