Hemispherical grained Si formation on in-situ phosphorus doped amorphous-Si electrode for 256 Mb DRAM's capacitor
1995 ◽
Vol 42
(7)
◽
pp. 1247-1254
◽
Keyword(s):
2014 ◽
Vol 54
(15)
◽
pp. 4646-4650
◽
Keyword(s):
Keyword(s):
2019 ◽
Vol 21
(31)
◽
pp. 17356-17365
◽
Keyword(s):