Direct modification of conductive AFM probes by focused electron beam induced deposition

A fluorine free copper precursor, Cu(tbaoac)2 with the chemical sum formula CuC16O6H26 is introduced for focused electron beam induced deposition (FEBID). FEBID with 15 keV and 7 nA results in deposits with an atomic composition of Cu:O:C of approximately 1:1:2. Transmission electron microscopy proved that pure copper nanocrystals with sizes of up to around 15 nm were dispersed inside the carbonaceous matrix. Raman investigations revealed a high degree of amorphization of the carbonaceous matrix and showed hints for partial copper oxidation taking place selectively on the surfaces of the deposits. Optical transmission/reflection measurements of deposited pads showed a dielectric behavior of the material in the optical spectral range. The general behavior of the permittivity could be described by applying the Maxwell–Garnett mixing model to amorphous carbon and copper. The dielectric function measured from deposited pads was used to simulate the optical response of tip arrays fabricated out of the same precursor and showed good agreement with measurements. This paves the way for future plasmonic applications with copper-FEBID.

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A critical literature review of focused electron beam induced deposition

Journal of Applied Physics ◽

10.1063/1.2977587 ◽

2008 ◽

Vol 104 (8) ◽

pp. 081301 ◽

Cited By ~ 368

Author(s):

W. F. van Dorp ◽

C. W. Hagen

Keyword(s):

Electron Beam ◽

Literature Review ◽

Electron Beam Induced Deposition ◽

Critical Literature

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Direct writing of CoFe alloy nanostructures by focused electron beam induced deposition from a heteronuclear precursor

Nanotechnology ◽

10.1088/0957-4484/26/47/475701 ◽

2015 ◽

Vol 26 (47) ◽

pp. 475701 ◽

Cited By ~ 43

Author(s):

F Porrati ◽

M Pohlit ◽

J Müller ◽

S Barth ◽

F Biegger ◽

...

Keyword(s):

Electron Beam ◽

Direct Writing ◽

Alloy Nanostructures ◽

Electron Beam Induced Deposition

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Assembly inside a Scanning Electron Microscope using Electron Beam induced Deposition

2006 IEEE/RSJ International Conference on Intelligent Robots and Systems ◽

10.1109/iros.2006.282237 ◽

2006 ◽

Cited By ~ 9

Author(s):

T. Wich ◽

T. Sievers ◽

S. Fatikow

Keyword(s):

Electron Beam ◽

Electron Microscope ◽

Scanning Electron Microscope ◽

Electron Beam Induced Deposition ◽

Scanning Electron

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Surface excitations in the modelling of electron transport for electron-beam-induced deposition experiments

Beilstein Journal of Nanotechnology ◽

10.3762/bjnano.6.129 ◽

2015 ◽

Vol 6 ◽

pp. 1260-1267 ◽

Cited By ~ 1

Author(s):

Francesc Salvat-Pujol ◽

Roser Valentí ◽

Wolfgang S Werner

Keyword(s):

Electron Beam ◽

Electron Transport ◽

Primary Energy ◽

Primary Electron ◽

Sizeable Fraction ◽

The Subject ◽

Electron Beam Induced Deposition ◽

The One ◽

Electron Energy Loss ◽

General Perspective

The aim of the present overview article is to raise awareness of an essential aspect that is usually not accounted for in the modelling of electron transport for focused-electron-beam-induced deposition (FEBID) of nanostructures: Surface excitations are on the one hand responsible for a sizeable fraction of the intensity in reflection-electron-energy-loss spectra for primary electron energies of up to a few kiloelectronvolts and, on the other hand, they play a key role in the emission of secondary electrons from solids, regardless of the primary energy. In this overview work we present a general perspective of recent works on the subject of surface excitations and on low-energy electron transport, highlighting the most relevant aspects for the modelling of electron transport in FEBID simulations.

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