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High performance high-k/metal gate germanium MOSFETs with shallow junction fabricated by laser thermal process
2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings
◽
10.1109/icsict.2006.306122
◽
2006
◽
Author(s):
Q.C. Zhang
◽
J. Huang
◽
N. Wu
◽
G. Chen
◽
M. Hong
◽
...
Keyword(s):
Thermal Process
◽
High Performance
◽
Metal Gate
◽
Shallow Junction
◽
High K
Download Full-text
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32nm gate-first high-k/metal-gate technology for high performance low power applications
2008 IEEE International Electron Devices Meeting
◽
10.1109/iedm.2008.4796770
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2008
◽
Cited By ~ 12
Author(s):
C. H. Diaz
◽
K. Goto
◽
H.T. Huang
◽
Yuri Yasuda
◽
C.P. Tsao
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...
Keyword(s):
Low Power
◽
High Performance
◽
Metal Gate
◽
High K
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Tradeoff Between Hot Carrier and Negative Bias Temperature Degradations in High-Performance $\hbox{Si}_{1 - x}\hbox{Ge}_{x}$ pMOSFETs With High-$k$/Metal Gate Stacks
IEEE Electron Device Letters
◽
10.1109/led.2010.2071851
◽
2010
◽
Author(s):
Won-Ho Choi
◽
Chang-Young Kang
◽
Jung-Woo Oh
◽
Byoung-Hun Lee
◽
Prashant Majhi
◽
...
Keyword(s):
High Performance
◽
Negative Bias
◽
Gate Stacks
◽
Metal Gate
◽
Hot Carrier
◽
High K
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High Performance Metal Gate CMOSFETs with Aggressively Scaled Hf-Based High-k
ECS Transactions
◽
10.1149/1.2209308
◽
2019
◽
Vol 1
(5)
◽
pp. 609-623
◽
Cited By ~ 4
Author(s):
Seung-Chul Song
◽
G. L. Zhang
◽
S. H. Bae
◽
P. Kirsch
◽
P. Majhi
◽
...
Keyword(s):
High Performance
◽
Metal Gate
◽
High K
Download Full-text
(Invited) Advanced Replacement High-K/Metal Gate Stack Engineering for High-Performance Strained Silicon-Germanium Finfets with High Ge Content
ECS Meeting Abstracts
◽
10.1149/ma2018-02/31/1018
◽
2018
◽
Keyword(s):
Silicon Germanium
◽
High Performance
◽
Strained Silicon
◽
Metal Gate
◽
Gate Stack
◽
High K
Download Full-text
High performance FDSOI CMOS technology with metal gate and high-k
Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005.
◽
10.1109/.2005.1469272
◽
2005
◽
Cited By ~ 12
Author(s):
B. Doris
◽
Y.H. Kim
◽
B.P. Linder
◽
M. Steen
◽
V. Narayanan
◽
...
Keyword(s):
High Performance
◽
Cmos Technology
◽
Metal Gate
◽
High K
Download Full-text
Intrinsic dielectric stack reliability of a high performance bulk planar 20nm replacement gate high-k metal gate technology and comparison to 28nm gate first high-k metal gate process
2013 IEEE International Reliability Physics Symposium (IRPS)
◽
10.1109/irps.2013.6532016
◽
2013
◽
Cited By ~ 7
Author(s):
W. McMahon
◽
C. Tian
◽
S. Uppal
◽
H. Kothari
◽
M. Jin
◽
...
Keyword(s):
High Performance
◽
Metal Gate
◽
High K
Download Full-text
Low temperature (≤ 380°C) and high performance Ge CMOS technology with novel source/drain by metal-induced dopants activation and high-k/metal gate stack for monolithic 3D integration
2008 IEEE International Electron Devices Meeting
◽
10.1109/iedm.2008.4796702
◽
2008
◽
Cited By ~ 19
Author(s):
Jin-Hong Park
◽
Munehiro Tada
◽
Duygu Kuzum
◽
Pawan Kapur
◽
Hyun-Yong Yu
◽
...
Keyword(s):
Low Temperature
◽
High Performance
◽
Cmos Technology
◽
3D Integration
◽
Metal Gate
◽
Gate Stack
◽
High K
Download Full-text
Characterization of Random Telegraph Signal Noise of High-Performance p-MOSFETs With a High-$k$ Dielectric/Metal Gate
IEEE Electron Device Letters
◽
10.1109/led.2011.2114633
◽
2011
◽
Vol 32
(5)
◽
pp. 686-688
◽
Cited By ~ 26
Author(s):
Hyuk-Min Kwon
◽
In-Shik Han
◽
Jung-Deuk Bok
◽
Sang-Uk Park
◽
Yi-Jung Jung
◽
...
Keyword(s):
High Performance
◽
Metal Gate
◽
Random Telegraph Signal
◽
Signal Noise
◽
High K
◽
High K Dielectric
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A 32nm SoC platform technology with 2nd generation high-k/metal gate transistors optimized for ultra low power, high performance, and high density product applications
2009 IEEE International Electron Devices Meeting (IEDM)
◽
10.1109/iedm.2009.5424258
◽
2009
◽
Cited By ~ 13
Author(s):
C.-H. Jan
◽
M. Agostinelli
◽
M. Buehler
◽
Z.-P. Chen
◽
S.-J. Choi
◽
...
Keyword(s):
Low Power
◽
High Performance
◽
High Density
◽
Metal Gate
◽
Ultra Low Power
◽
High K
◽
Platform Technology
Download Full-text
A 22nm SoC platform technology featuring 3-D tri-gate and high-k/metal gate, optimized for ultra low power, high performance and high density SoC applications
2012 International Electron Devices Meeting
◽
10.1109/iedm.2012.6478969
◽
2012
◽
Cited By ~ 124
Author(s):
C.-H. Jan
◽
U. Bhattacharya
◽
R. Brain
◽
S.-J. Choi
◽
G. Curello
◽
...
Keyword(s):
Low Power
◽
High Performance
◽
High Density
◽
Metal Gate
◽
Ultra Low Power
◽
High K
◽
Platform Technology
Download Full-text
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