scholarly journals Fabrication of photonic crystal structures by focused ion beam etching

Author(s):  
M. Hill ◽  
M. Cryan ◽  
N. Lim ◽  
R. Varrazza ◽  
P. Heard ◽  
...  
MRS Advances ◽  
2017 ◽  
Vol 2 (18) ◽  
pp. 981-986 ◽  
Author(s):  
Swagata Samanta ◽  
Pallab Banerji ◽  
Pranabendu Ganguly

ABSTRACTThis work deals with SU-8 waveguides and waveguide structures fabricated on an oxidized silicon substrate using ‘Focused ion beam (FIB) lithography’. From our experimentation it seems that FIB method is practically not suitable for fabricating long SU-8 waveguide structures, rather it is more suitable for nanoscale modification of already fabricated waveguides, such as, to fabricate photonic crystal structures.


2006 ◽  
Vol 05 (06) ◽  
pp. 743-746
Author(s):  
SHOUZHEN HAN ◽  
JIE TIAN ◽  
CHENG REN ◽  
XINGSHENG XU ◽  
ZHIYUAN LE ◽  
...  

The abstract should summarize the context, content and conclusions of the paper in less than 200 words. We fabricated a two-dimensional Y-branch photonic crystal waveguide in the near infrared region by using focused ion beam etching and depositing system. The light guide characters of the waveguide were measured for three different spaces between branches. Field intensity distributions of TE polarized wave in the branches were simulated by using the transfer matrix method. Both the theoretical and experimental results show that the shortest space between branches of the photonic crystal waveguide is about 1.4 times wavelength of transmitted light. If the space became shorter, the light in the two branches would couple to each other seriously. This result might be helpful for the design of compact wave demultiplexer and all-optical integrated circuits.


2017 ◽  
Vol 6 (6) ◽  
pp. 497-503 ◽  
Author(s):  
Ranran Fan ◽  
Fei Lu ◽  
Kaikai Li

AbstractErbium (Er)-doped ZnO thin film is fabricated on sapphire substrate by radio frequency magnetron sputtering technology. The as-deposited Er:ZnO film has a good film quality and exhibits excellent single-mode waveguide characteristic. A photonic crystal structure in the Er:ZnO film is fabricated by focused-ion-beam etching. When the film is stimulated by a 532 nm laser, photoluminescence (PL) at 1540 nm can be excited. Simulation results show that the propagation of Er-related emission of 1540 nm will be well restricted along a certain direction in the photonic crystal structure. It provides a novel way to control and confine the transmission of light in ZnO waveguide and will be applicable for the application of Er:ZnO photonic devices.


2016 ◽  
Vol 63 (2) ◽  
pp. 644-648 ◽  
Author(s):  
Pawel Modrzynski ◽  
Teodor Gotszalk ◽  
Arno Knapitsch ◽  
Piotr Kunicki ◽  
Paul Lecoq ◽  
...  

2011 ◽  
Vol 7 (4) ◽  
pp. 594-597
Author(s):  
Zhan-Shuo Hu ◽  
Fei-Yi Hung ◽  
Shoou-Jinn Chang ◽  
Bohr-Ran Huang ◽  
Bo-Cheng Lin ◽  
...  

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