High performance metal oxide TFT and its applications for thin film electronics

Author(s):  
Gang Yu ◽  
Chan-Long Shieh ◽  
Juergen Musolf ◽  
Fatt Foong ◽  
Tian Xiao ◽  
...  
2011 ◽  
Vol 10 (5) ◽  
pp. 382-388 ◽  
Author(s):  
Myung-Gil Kim ◽  
Mercouri G. Kanatzidis ◽  
Antonio Facchetti ◽  
Tobin J. Marks

ACS Nano ◽  
2019 ◽  
Vol 13 (12) ◽  
pp. 13957-13964 ◽  
Author(s):  
You Liang ◽  
Jason Yong ◽  
Yang Yu ◽  
Ampalavanapillai Nirmalathas ◽  
Kumaravelu Ganesan ◽  
...  

2022 ◽  
Author(s):  
Ali Sehpar Shikoh ◽  
Gi Sang Choi ◽  
Sungmin Hong ◽  
Kwang Seob Jeong ◽  
Jaekyun Kim

Abstract We report that high absorption PbSe colloidal quantum dots (QDs) having a peak absorbance beyond 2100 nm were synthesized and incorporated into InSnZnO (ITZO) channel layer-based thin film transistors (TFTs). It was intended that PbSe QDs with proportionally less photocurrent modulation can be remedied by semiconducting and low off-current ITZO-based TFT configuration. Multiple deposition scheme of PbSe QDs on ITZO metal oxide thin film gave rise to nearly linear increase of film thickness with acceptably uniform and smooth surface (less than 10 nm). Hybrid PbSe/ITZO thin film-based phototransistor exhibited the best performance of near infrared (NIR) detection in terms of response time, sensitivity and detectivity as high as 0.38 s, 3.91 and 4.55 × 107 Jones at room temperature, respectively. This is indebted mainly from the effective diffusion of photogenerated carrier from the PbSe surface to ITZO channel layer as well as from the conduction band alignment between them. Therefore, we believe that our hybrid PbSe/ITZO material platform can be widely used to be in favour of incorporation of solution-processed colloidal light absorbing material into the high-performance metal oxide thin film transistor configuration.


2020 ◽  
Vol 7 (9) ◽  
pp. 1822-1844 ◽  
Author(s):  
Nidhi Tiwari ◽  
Amoolya Nirmal ◽  
Mohit Rameshchandra Kulkarni ◽  
Rohit Abraham John ◽  
Nripan Mathews

The review highlights low temperature activation processes for high performance n-type metal oxide semiconductors for TFTs.


2020 ◽  
Vol 527 ◽  
pp. 146774 ◽  
Author(s):  
Fuchao He ◽  
Yu Qin ◽  
Liaojun Wan ◽  
Jie Su ◽  
Zhenhua Lin ◽  
...  

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