Magnetoresistive power sensor for measurement "in situ" of RF power absorbed by tissue

Author(s):  
V. Vountesmeri
Keyword(s):  
Rf Power ◽  
1995 ◽  
Vol 386 ◽  
Author(s):  
J. E. Parmeter ◽  
R. J. Shul ◽  
P. A. Miller

ABSTRACTWe have used in situ Auger spectroscopic analysis to investigate the composition of InP surfaces cleaned in rf H2 plasmas and etched in rf H2/CH4/Ar plasmas. In general agreement with previous results, hydrogen plasma treatment is found to remove surface carbon and oxygen impurities but also leads to substantial surface phosphorus depletion if not carefully controlled. Low plasma exposure times and rf power settings minimize both phosphorus depletion and surface roughening. Surfaces etched in H2/CH4/Ar plasmas can show severe phosphorus depletion in high density plasmas leading to etch rates of ∼ 700 Å/min, but this effect is greatly reduced in lower density plasmas that produce etch rates of 30–400 Å/min.


Author(s):  
Hanlin Xie ◽  
Zhihong Liu ◽  
Wenrui Hu ◽  
Yu Gao ◽  
Hui Teng Tan ◽  
...  

Abstract AlN/GaN metal-insulator-semiconductor high electron mobility transistors (MISHEMTs) on silicon substrate using in-situ SiN as gate dielectric were fabricated and their RF power performance at mobile system-on-chip (SoC) compatible voltages was measured. At a mobile SoC-compatible supply voltage of Vd = 3.5 V/5 V, the 90-nm gate-length AlN/GaN MISHEMTs showed a maximum power-added efficiency (PAE) of 62%/58%, a maximum output power density (Poutmax) of 0.44 W/mm/0.84 W/mm and a linear gain of 20 dB/19 dB at the frequency of 5 GHz. These results suggest that the in-situ-SiN/AlN/GaN-on-Si MISHEMTs are promising for RF power amplifiers in 5G mobile SoC applications.


2018 ◽  
Vol 33 (4) ◽  
pp. 045014 ◽  
Author(s):  
F Brunner ◽  
J-T Zettler ◽  
M Weyers

2010 ◽  
Vol 443 ◽  
pp. 469-474 ◽  
Author(s):  
Mohd Hamdi Bin Abdul Shukor ◽  
J.A. Toque ◽  
A. Ide-Ektessabi

Wear resistance is an important mechanical property expected from coatings intended for any type of applications. Understanding of this quantity is very practical because in real situations, coatings are subjected to repeating loads experienced not in a gradual orderly fashion but abruptly and indeterminately. This study looked into the wear characteristic and adhesion behavior of calcium phosphate, a known bioceramics, and hopes to provide better understanding of these properties. Radio frequency-magnetron sputtering (RF-MS) was used to deposit thin film (CaP) on glass. The coatings were subjected to single-pass microscratch and multi-pass wear test while monitoring the depth, load and displacement in situ. The results have shown that the changes in the surface topography can give an indication of the wear resistance of CaP. Coatings with good adherence to the substrate have shown less alteration of its surface roughness, measured in terms of Ra values, even after several scratch passes. The study on the different parameters revealed that deposition time is the most influential factor in CaP wear behavior. This was attributed to its correlation with coating thickness. Analysis of variance (ANOVA) also suggested that the other sputtering parameters studied in the experiments (argon pressure and RF power) did not have very significant effect on the wear pattern of the CaP thin films.


Sign in / Sign up

Export Citation Format

Share Document