Plasma-Enhanced Atomic Layer Deposition Processed SiO2 Gate Insulating Layer for High Mobility Top-Gate Structured Oxide Thin-Film Transistors
2016 ◽
Vol 37
(1)
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pp. 39-42
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2015 ◽
Vol 46
(S1)
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pp. 52-52
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2014 ◽
Vol 61
(1)
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pp. 73-78
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2017 ◽
Vol 9
(27)
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pp. 22676-22684
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2012 ◽
Vol 51
(2S)
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pp. 02BF04
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2011 ◽
Keyword(s):
2018 ◽
Vol 44
(2)
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pp. 1556-1565
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2019 ◽
Vol 37
(6)
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pp. 060910
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