Improvement of Line Width Roughness and Line Edge Roughness for Ultrascaled Finfet Technologies

ECS Meeting Abstracts ◽

10.1149/ma2018-01/22/1393 ◽

2018 ◽

Keyword(s):

Line Edge Roughness ◽

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Application of cellular neural networks in the measurement of line-width and line edge roughness

10.1117/12.676727 ◽

2006 ◽

Author(s):

Hong-bo Li ◽

Xue-zheng Zhao ◽

Wei Chu ◽

Ning Li

Keyword(s):

Neural Networks ◽

Cellular Neural Networks ◽

Line Edge Roughness ◽

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Characterization of line edge roughness and line width roughness of nano-scale typical structures

2009 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems ◽

10.1109/nems.2009.5068582 ◽

2009 ◽

Author(s):

Zhuangde Jiang ◽

Fengxia Zhao ◽

Weixuan Jing ◽

Philip D. Prewett ◽

Kyle Jiang

Keyword(s):

Line Edge Roughness ◽

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Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part I–Modeling and Simulation Method

IEEE Transactions on Electron Devices ◽

10.1109/ted.2013.2283518 ◽

2013 ◽

Vol 60 (11) ◽

pp. 3669-3675 ◽

Author(s):

Xiaobo Jiang ◽

Runsheng Wang ◽

Tao Yu ◽

Jiang Chen ◽

Ru Huang

Keyword(s):

Modeling And Simulation ◽

Simulation Method ◽

Cmos Technology ◽

Line Edge Roughness ◽

Nanoscale Cmos ◽

Edge Roughness ◽

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Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach

10.1117/12.2085812 ◽

2015 ◽

Author(s):

E. Dupuy ◽

E. Pargon ◽

M. Fouchier ◽

H. Grampeix ◽

J. Pradelles ◽

...

Keyword(s):

Spectral Analysis ◽

Line Edge Roughness ◽

Edge Roughness ◽

Double Patterning

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Effects of dose shift on line width, line edge roughness, and stochastic defect generation in chemically amplified extreme ultraviolet resist with photodecomposable quencher

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.016503 ◽

2014 ◽

Vol 54 (1) ◽

pp. 016503

Author(s):

Takahiro Kozawa

Keyword(s):

Extreme Ultraviolet ◽

Line Edge Roughness ◽

Defect Generation ◽

Chemically Amplified ◽

Edge Roughness ◽

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Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.016502 ◽

2014 ◽

Vol 54 (1) ◽

pp. 016502 ◽

Author(s):

Takahiro Kozawa

Keyword(s):

Extreme Ultraviolet ◽

Diffusion Constant ◽

Exposure Dose ◽

Extreme Ultraviolet Lithography ◽

Line Edge Roughness ◽

Ultraviolet Lithography ◽

Defect Generation ◽

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Investigations on the correlation between line-edge-roughness (LER) and line-width-roughness (LWR) in nanoscale CMOS technology

2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology ◽

10.1109/icsict.2012.6466733 ◽

2012 ◽

Author(s):

Xiaobo Jiang ◽

Meng Li ◽

Runsheng Wang ◽

Jiang Chen ◽

Ru Huang

Keyword(s):

Cmos Technology ◽

Line Edge Roughness ◽

Nanoscale Cmos ◽

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Mitigation of line edge roughness and line width roughness in block copolymer directed self-assembly through polymer composition molecular weight manipulation

Advances in Patterning Materials and Processes XXXVI ◽

10.1117/12.2526418 ◽

2019 ◽

Author(s):

Jakin B. Delony ◽

Peter J. Ludovice ◽

Clifford L. Henderson

Keyword(s):

Molecular Weight ◽

Block Copolymer ◽

Self Assembly ◽

Polymer Composition ◽

Line Edge Roughness ◽

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Key contributors for improvement of line width roughness, line edge roughness, and critical dimension uniformity: 15 nm half-pitch patterning with extreme ultraviolet and self-aligned double patterning

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.jmm.12.4.041302 ◽

2013 ◽

Vol 12 (4) ◽

pp. 041302 ◽

Author(s):

Kaidong Xu ◽

Laurent Souriau ◽

David Hellin ◽

Janko Versluijs ◽

Patrick Wong ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Critical Dimension ◽

Line Edge Roughness ◽

Edge Roughness ◽

Double Patterning

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Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

10.1117/12.534926 ◽

2004 ◽

Author(s):

Ji-Young Lee ◽

Jangho Shin ◽

Hyun-Woo Kim ◽

Sang-Gyun Woo ◽

Han-Ku Cho ◽

...

Keyword(s):

Device Performance ◽

Line Edge Roughness ◽

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