Steady-state low-emittance electron beam from hollow cathode plasmas

1991 ◽  
Author(s):  
J.N. Bardsley
Keyword(s):  
Electron Beam ◽  
Steady State ◽  
Hollow Cathode ◽  
Low Emittance

scholarly journals A three-dimensional steady state thermal fluid model of jumbo ingot casting during electron beam re-melting of Ti–6Al–4V

2014 ◽  
Vol 38 (14) ◽  
pp. 3607-3623 ◽  
Author(s):  
X. Zhao ◽  
C. Reilly ◽  
L. Yao ◽  
D.M. Maijer ◽  
S.L. Cockcroft ◽  
...  
Keyword(s):  
Electron Beam ◽  
Steady State ◽  
Fluid Model ◽  
Three Dimensional ◽  
Ingot Casting

Plasma localization in an extended hollow cathode of the plasma source of a ribbon electron beam

2006 ◽  
Vol 51 (10) ◽  
pp. 1316-1319 ◽  
Author(s):  
Yu. A. Burachevsky ◽  
V. A. Burdovitsin ◽  
A. S. Klimov ◽  
E. M. Oks ◽  
M. V. Fedorov
Keyword(s):  
Electron Beam ◽  
Hollow Cathode ◽  
Plasma Source

A 200keV Gun with NEA-GaAs Photocathode to Produce Low Emittance Electron Beam

2004 ◽  
pp. II-39-II-40
Author(s):  
M. Yamamoto ◽  
K. Wada ◽  
N. Yamamoto ◽  
T. Nakanishi ◽  
S. Okumi ◽  
...  
Keyword(s):  
Electron Beam ◽  
Low Emittance

scholarly journals Forevacuum plasma source of continuous electron beam

2019 ◽  
Vol 37 (2) ◽  
pp. 203-208 ◽  
Author(s):  
Aleksandr Klimov ◽  
Ilya Bakeev ◽  
Efim Oks ◽  
Aleksey Zenin
Keyword(s):  
Electron Beam ◽  
Power Density ◽  
Hollow Cathode ◽  
Plasma Source ◽  
Electron Source ◽  
Hollow Cathode Discharge ◽  
Maximum Power ◽  
Maximum Power Density ◽  
Plasma Cathode ◽  
Pressure Plasma

AbstractWe describe here the design, main parameters, and characteristics of a forevacuum-pressure plasma-cathode electron source based on a hollow-cathode discharge. The source generates a continuous focused electron beam with energy up to 30 keV and current up to 300 mA at a pressure of 10–50 Pa. The focused electron beam reaches a maximum power density of 106 W/cm2. The source utility has been demonstrated by its application for processing and cutting of ceramic.

PRODUCTION OF FEMTOSECOND PULSES AND MICRON BEAM SPOTS FOR HIGH BRIGHTNESS ELECTRON BEAM APPLICATIONS

2007 ◽  
Vol 22 (22) ◽  
pp. 3726-3735
Author(s):  
S. G. ANDERSON ◽  
D. J. GIBSON ◽  
F. V. HARTEMANN ◽  
J. S. JACOB ◽  
A. M. TREMAINE ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beams ◽  
Beam Radiation ◽  
High Brightness ◽  
X Ray ◽  
Inverse Compton Scattering ◽  
Inverse Compton ◽  
Strong Focusing ◽  
Moderate Energy ◽  
Low Emittance

Current and future applications of high brightness electron beams, which include advanced accelerators and beam-radiation interactions require both transverse and longitudinal beam sizes on the order of tens of microns. Ultra-high density beams may be produced at moderate energy (50 MeV) by compression and subsequent strong focusing of low emittance, photoinjector sources. We describe the implementation of this method used at the PLEIADES inverse-Compton scattering (ICS) x-ray source at LLNL in which the photoinjector-generated beam has been compressed to 300 fsec rms duration using the velocity bunching technique and focused to 20 μm rms size using an extremely high gradient, permanent magnet quadrupole focusing system.

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