Characterization of negative ion beam extracted from a negative ion source with a particle-in-cell model

2015 ◽  
Author(s):  
Laurent Garrigues ◽  
Gwenael Fubiani ◽  
Jean-Pierre Boeuf
Keyword(s):  
Cell Model ◽  
Ion Beam ◽  
Ion Source ◽  
Negative Ion ◽  
Particle In Cell

Characteristics of extracted ion beam from a cesium-free negative ion source using sheet plasma

2020 ◽  
Vol 91 (11) ◽  
pp. 113302
Author(s):  
H. Kaminaga ◽  
T. Takimoto ◽  
A. Tonegawa ◽  
K. N. Sato
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Negative Ion ◽  
Sheet Plasma

scholarly journals Characterization of hydrogen plasma in a permanent ring magnet based helicon plasma source for negative ion source research

2019 ◽  
Vol 61 (6) ◽  
pp. 065003 ◽  
Author(s):  
A Pandey ◽  
Debrup Mukherjee ◽  
Dipshikha Borah ◽  
M Bandyopadhyay ◽  
Himanshu Tyagi ◽  
...  
Keyword(s):  
Hydrogen Plasma ◽  
Plasma Source ◽  
Ion Source ◽  
Negative Ion ◽  
Helicon Plasma ◽  
Ring Magnet

scholarly journals Plasma characterization of a Hall effect thruster for a negative ion source concept

2018 ◽  
Author(s):  
M. Fadone ◽  
V. Antoni ◽  
D. Aprile ◽  
G. Chitarin ◽  
A. Fassina ◽  
...  
Keyword(s):  
Hall Effect ◽  
Ion Source ◽  
Negative Ion ◽  
Hall Effect Thruster ◽  
Plasma Characterization

Characterization of Surfaces and Thin Films by Means of an Ion Microprobe Analyzer

1986 ◽  
Vol 75 ◽  
Author(s):  
Eiichi Izumi ◽  
Yoshinori Ikebe ◽  
Hiroyasu Shichi ◽  
Hifumi Tamura
Keyword(s):  
Thin Films ◽  
Depth Profile ◽  
Ion Beam ◽  
Depth Resolution ◽  
Negative Ion ◽  
Plastic Film ◽  
Ion Microprobe ◽  
Monitoring Method ◽  
Secondary Ion

A variety of materials such as semiconductors, metals, and insulators have been analyzed by use of the Hitachi IMA-3 ion microprobe analyzer. From the depth profile of a GaAs/AQ GaAs superlattice(50Å), a depth resolution of 45Å was obtained at 2350Å below the surface. The stable depth profile of a multilayer plastic film was obtained by using the negative ion beam(O) as a primary ion for charge neutralization. Further, the usefulness of the total ion monitoring method for correcting the changing factors of secondary ion intensity is demonstrated.

Ion beam transport: modelling and experimental measurements on a large negative ion source in view of the ITER heating neutral beam

2016 ◽  
Vol 57 (1) ◽  
pp. 016025 ◽  
Author(s):  
P. Veltri ◽  
E. Sartori ◽  
P. Agostinetti ◽  
D. Aprile ◽  
M. Brombin ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Negative Ion ◽  
Neutral Beam ◽  
Experimental Measurements ◽  
Beam Transport ◽  
Transport Modelling

The characterization of a magnetron-sputter-type negative-ion source

2002 ◽  
Vol 73 (3) ◽  
pp. 1212-1216 ◽  
Author(s):  
Nam-Woong Paik ◽  
Steven Kim
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Magnetron Sputter

Experimental study on spatial uniformity of H− ion beam in a large negative ion source

2005 ◽  
Vol 74 (1-4) ◽  
pp. 311-317 ◽  
Author(s):  
M. Hanada ◽  
T. Seki ◽  
N. Takado ◽  
T. Inoue ◽  
T. Morishita ◽  
...  
Keyword(s):  
Experimental Study ◽  
Ion Beam ◽  
Ion Source ◽  
Negative Ion ◽  
Spatial Uniformity
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