Numerical simulation of nanoparticle transport during plasma-enhanced chemical vapor deposition

IEEE Transactions on Plasma Science ◽

10.1109/tps.2005.845321 ◽

2005 ◽

Vol 33 (2) ◽

pp. 398-399

Author(s):

S.J. Warthesen ◽

U. Kortshagen ◽

S.L. Girshick

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanoparticle Transport

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Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies ◽

10.1007/978-94-010-0353-7_6 ◽

2002 ◽

pp. 119-144 ◽

Author(s):

C. R. Kleijn

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Deposition Processes

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A multigrid solver for fluid flow and mass transfer coupled with grey-body surface radiation for the numerical simulation of chemical vapor deposition processes

Journal of Crystal Growth ◽

10.1016/0022-0248(94)00571-0 ◽

1995 ◽

Vol 146 (1-4) ◽

pp. 202-208 ◽

Author(s):

F. Durst ◽

L. Kadinski ◽

M. Schäfer

Keyword(s):

Numerical Simulation ◽

Mass Transfer ◽

Chemical Vapor Deposition ◽

Body Surface ◽

Vapor Deposition ◽

Chemical Vapor ◽

Surface Radiation ◽

Deposition Processes ◽

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NUMERICAL SIMULATION OF CHEMICAL VAPOR DEPOSITION PROCESSES UNDER VARIABLE AND CONSTANT PROPERTY APPROXIMATIONS

Numerical Heat Transfer Part A Applications ◽

10.1080/104077800274334 ◽

2000 ◽

Vol 37 (2) ◽

pp. 113-132 ◽

Author(s):

Wilson K. S. Chiu, Yogesh Jaluria,

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Constant Property ◽

Deposition Processes

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3D Block-Structured Grid Algorithms for the Numerical Simulation of Chemical Vapor Deposition in Horizontal Reactors

Lecture Notes in Computational Science and Engineering - High Performance Scientific And Engineering Computing ◽

10.1007/978-3-642-55919-8_30 ◽

2002 ◽

pp. 269-278

Author(s):

L. Kadinski ◽

P. Kaufmann ◽

C. Lindner ◽

F. Durst

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Structured Grid ◽

Grid Algorithms ◽

Block Structured

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Numerical Simulation of Plasma Chemical Vapor Deposition from Silane: Effects of the Plasma-Substrate Distance and Hydrogen Dilution

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.3396 ◽

1997 ◽

Vol 36 (Part 1, No. 6A) ◽

pp. 3396-3407 ◽

Author(s):

Motoaki Kawase ◽

Tsuyoshi Nakai ◽

Akimasa Yamaguchi ◽

Tomohiro Hakozaki ◽

Kenji Hashimoto

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Substrate Distance ◽

Hydrogen Dilution

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Numerical simulation of supersonic internal flow for an arc-heated chemical vapor deposition reactor

10.2514/6.1995-2208 ◽

1995 ◽

Author(s):

C Moen ◽

H Dwyer

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Internal Flow ◽

Chemical Vapor Deposition Reactor

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Numerical simulation of carbon reflection on silicon substrate in chemical vapor deposition method by molecular dynamics

10.1117/12.429598 ◽

2001 ◽

Author(s):

Tomoo Kayaba ◽

Y. Hamada ◽

M. Saka

Keyword(s):

Numerical Simulation ◽

Molecular Dynamics ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Substrate ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method

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Numerical simulation on turbulent flows in vertical chemical vapor deposition reactors

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2010.11.070 ◽

2011 ◽

Vol 318 (1) ◽

pp. 168-172 ◽

Author(s):

Yan Tian ◽

Chang-Feng Li ◽

Hua-Hong Jiang ◽

Hui Li ◽

Ran Zuo

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Turbulent Flows ◽

Vapor Deposition ◽

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Numerical simulation of chemical vapor deposition reaction in polysilicon reduction furnace

Journal of Central South University ◽

10.1007/s11771-016-3047-7 ◽

2016 ◽

Vol 23 (1) ◽

pp. 44-51

Author(s):

Xiao-xia Xia ◽

Zhi-qi Wang ◽

Bin Liu

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Reduction Furnace ◽

Chemical Vapor Deposition Reaction

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Numerical Simulation of Metallorganic Chemical Vapor Deposition of Copper in a Single‐Wafer Reactor

Journal of The Electrochemical Society ◽

10.1149/1.1837676 ◽

1997 ◽

Vol 144 (5) ◽

pp. 1765-1773 ◽

Author(s):

B. M. Kim ◽

Hong H. Lee

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

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