Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies ◽

10.1007/978-94-010-0353-7_6 ◽

2002 ◽

pp. 119-144 ◽

Author(s):

C. R. Kleijn

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Deposition Processes

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A multigrid solver for fluid flow and mass transfer coupled with grey-body surface radiation for the numerical simulation of chemical vapor deposition processes

Journal of Crystal Growth ◽

10.1016/0022-0248(94)00571-0 ◽

1995 ◽

Vol 146 (1-4) ◽

pp. 202-208 ◽

Author(s):

F. Durst ◽

L. Kadinski ◽

M. Schäfer

Keyword(s):

Numerical Simulation ◽

Mass Transfer ◽

Chemical Vapor Deposition ◽

Body Surface ◽

Vapor Deposition ◽

Chemical Vapor ◽

Surface Radiation ◽

Deposition Processes ◽

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NUMERICAL SIMULATION OF CHEMICAL VAPOR DEPOSITION PROCESSES UNDER VARIABLE AND CONSTANT PROPERTY APPROXIMATIONS

Numerical Heat Transfer Part A Applications ◽

10.1080/104077800274334 ◽

2000 ◽

Vol 37 (2) ◽

pp. 113-132 ◽

Author(s):

Wilson K. S. Chiu, Yogesh Jaluria,

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Constant Property ◽

Deposition Processes

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Structural characteristics of diamond films prepared by thermal chemical vapor deposition processes

Thin Solid Films ◽

10.1016/0040-6090(92)90510-i ◽

1992 ◽

Vol 212 (1-2) ◽

pp. 133-136 ◽

Author(s):

F.S. Guo ◽

S.C. Yu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Structural Characteristics ◽

Diamond Films ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Deposition Processes

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Design of low-temperature thermal chemical vapor deposition processes

IBM Journal of Research and Development ◽

10.1147/rd.346.0795 ◽

1990 ◽

Vol 34 (6) ◽

pp. 795-805 ◽

Author(s):

D. B. Beach

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Deposition Processes

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Preparation of Boron and Boron Phosphide Films by Photo- and Thermal Chemical Vapor Deposition Processes

Journal of Solid State Chemistry ◽

10.1006/jssc.2000.8808 ◽

2000 ◽

Vol 154 (1) ◽

pp. 39-44 ◽

Author(s):

Y Kumashiro ◽

K Sato ◽

S Chiba ◽

S Yamada ◽

D Tanaka ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Boron Phosphide ◽

Deposition Processes

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Theoretical Study of Laser-Stimulated Chemical Vapor Deposition Processes of Importance in Microelectronics.

10.21236/ada136433 ◽

1983 ◽

Author(s):

T. F. George

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Theoretical Study ◽

Chemical Vapor ◽

Deposition Processes

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High yield production of 3D graphene powders by thermal chemical vapor deposition and application as highly efficient conductive additive of lithium ion battery electrodes

Carbon ◽

10.1016/j.carbon.2021.01.128 ◽

2021 ◽

Vol 176 ◽

pp. 21-30

Author(s):

Xixi Ji ◽

Yongbiao Mu ◽

Jingbing Liang ◽

Tao Jiang ◽

Jie Zeng ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Lithium Ion ◽

Chemical Vapor ◽

3D Graphene ◽

Thermal Chemical Vapor Deposition ◽

Conductive Additive ◽

Yield Production ◽

High Yield Production

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Surface characterization of mesoporous biomass activated carbon modified by thermal chemical vapor deposition and adsorptive mechanism of nitrate ions in aqueous solution

Colloids and Surfaces A Physicochemical and Engineering Aspects ◽

10.1016/j.colsurfa.2021.126213 ◽

2021 ◽

pp. 126213

Author(s):

Jinghan Yuan ◽

Yoshimasa Amano ◽

Motoi Machida

Keyword(s):

Aqueous Solution ◽

Activated Carbon ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Surface Characterization ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Nitrate Ions ◽

Adsorptive Mechanism

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ChemInform Abstract: Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition.

10.1002/chin.199406262 ◽

2010 ◽

Vol 25 (6) ◽

pp. no-no

Author(s):

X.-L. XU ◽

P. K. MCLARTY ◽

H. BRUSH ◽

V. MISRA ◽

J. J. WORTMAN ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Oxynitride ◽

Thermal Chemical Vapor Deposition ◽

Abstract Characterization ◽

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Effects of ammonia on the alignment of carbon nanotubes in metal-assisted thermal chemical vapor deposition

Journal of the European Ceramic Society ◽

10.1016/s0955-2219(01)00179-0 ◽

2001 ◽

Vol 21 (10-11) ◽

pp. 2095-2098 ◽

Author(s):

K.S Choi ◽

Y.S Cho ◽

S.Y Hong ◽

J.B Park ◽

D.J Kim

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition

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