chemical vapor deposition reaction
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scholarly journals Development of Analysing System for Chemical Vapor Deposition Reaction Mechanism Using Molecular Beam Sampling Method. (2).

Shinku ◽  
1995 ◽  
Vol 38 (5) ◽  
pp. 516-519 ◽  
Author(s):  
Yoshitsugu TSUTSUMI ◽  
Masato IKEGAWA ◽  
Tatehito USUI ◽  
Jun'ichi KOBAYASHI ◽  
Kazunori WATANABE
Keyword(s):  
Chemical Vapor Deposition ◽  
Reaction Mechanism ◽  
Vapor Deposition ◽  
Molecular Beam ◽  
Sampling Method ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Reaction

Gas Phase Decomposition of an Organometallic Chemical Vapor Deposition Precursor to AIN:[AI(CH3)2NH2]3

1989 ◽  
Vol 168 ◽  
Author(s):  
Carmela C. Amato ◽  
John B. Hudson ◽  
Leonard V. Interrante
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Molecular Beam ◽  
Chemical Vapor ◽  
Decomposition Temperature ◽  
Phase Decomposition ◽  
Novel Technique ◽  
Organometallic Precursor ◽  
Chemical Vapor Deposition Reaction

AbstractA novel technique for probing chemical vapor deposition reaction mechanisms is presented. A conventional hot-wall Pyrex reactor is coupled to a molecular beam apparatus. Preliminary results of the decomposition of an organometallic precursor to AIN, [AI(CH3)2NH2]3, indicate a decomposition temperature between 200 and 270°C. The mass spectrum of the precursor at 100°C provides evidence for the existence of a trimer-dimer equilibrium of the precursor at this temperature

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