Influence of Interfacial Mixing on Thermal Boundary Conductance Across a Chromium/Silicon Interface

2008 ◽  
Vol 130 (6) ◽  
Author(s):  
Patrick E. Hopkins ◽  
Pamela M. Norris ◽  
Robert J. Stevens ◽  
Thomas E. Beechem ◽  
Samuel Graham
Keyword(s):  
Electron Spectroscopy ◽  
Finite Thickness ◽  
Thermal Conductance ◽  
Phase Region ◽  
Two Phase ◽  
Thermal Boundary Conductance ◽  
Si Substrates ◽  
Interfacial Mixing ◽  
Silicon Interface ◽  
Deposition Conditions

The thermal conductance at solid-solid interfaces is becoming increasingly important in thermal considerations dealing with devices on nanometer length scales. Specifically, interdiffusion or mixing around the interface, which is generally ignored, must be taken into account when the characteristic lengths of the devices are on the order of the thickness of this mixing region. To study the effect of this interfacial mixing on thermal conductance, a series of Cr films is grown on Si substrates subject to various deposition conditions to control the growth around the Cr∕Si boundary. The Cr∕Si interfaces are characterized with Auger electron spectroscopy. The thermal boundary conductance (hBD) is measured with the transient thermoreflectance technique. Values of hBD are found to vary with both the thickness of the mixing region and the rate of compositional change in the mixing region. The effects of the varying mixing regions in each sample on hBD are discussed, and the results are compared to the diffuse mismatch model (DMM) and the virtual crystal DMM (VCDMM), which takes into account the effects of a two-phase region of finite thickness around the interface on hBD. An excellent agreement is shown between the measured hBD and that predicted by the VCDMM for a change in thickness of the two-phase region around the interface.

Dependence of Thermal Boundary Conductance on Interfacial Mixing at the Chromium-Silicon Interface

2006 ◽  
Author(s):  
Patrick E. Hopkins ◽  
Richard N. Salaway ◽  
Robert J. Stevens ◽  
Pamela M. Norris
Keyword(s):  
Electron Spectroscopy ◽  
Auger Electron ◽  
Thermal Conductance ◽  
Depth Profiling ◽  
Thermal Boundary Conductance ◽  
Si Substrates ◽  
Auger Electron Spectroscopy Depth ◽  
Interfacial Mixing ◽  
Silicon Interface ◽  
Deposition Conditions

The thermal conductance at solid-solid interfaces is becoming increasingly important in thermal considerations dealing with devices on nanometer length scales. Specifically, interdiffusion or mixing around the interface, which is generally ignored, must be taken into account when the characteristic lengths of the devices are on the order of the thickness of this mixing region. To study the effect of this interfacial mixing on thermal conductance, a series of Cr films are grown on Si substrates subject to various deposition conditions to control the growth around the Cr/Si boundary. The Cr/Si interfaces are characterized with auger electron spectroscopy depth profiling. The thermal boundary conductance (hBD) is measured with the transient thermoreflectance technique. Values of hBD are found to vary with both the thickness of the mixing region and the rate of compositional change in the mixing region. The effects of the varying mixing regions in each sample on hBD are discussed and the results are compared to the diffuse mismatch model.

The Effect of Oxygen in Cosputtered (Titanium + Silicon) Films

1982 ◽  
Vol 14 ◽  
Author(s):  
R. Beyers ◽  
R. Sinclair
Keyword(s):  
Electron Spectroscopy ◽  
Rutherford Backscattering Spectrometry ◽  
Cross Sectional ◽  
Si Substrates ◽  
Transmission Electron ◽  
Microscope Images ◽  
Effect Of Oxygen ◽  
Titanium Silicon ◽  
Silicon Interface ◽  
Deposited Films

ABSTRACTThe effect of oxygen incorporation on the growth and microstructure of TiSi2 has been investigated. Cosputtered films, with Si/Ti ratios between one and three, were deposited on (100) Si substrates and reacted at temperatures from 650° to 1050°C. Both Auger electron spectroscopy, in conjunction with sputter profiling, and Rutherford backscattering spectrometry indicate that oxygen in the as-deposited films redistributes to the silicide-silicon interface upon heating. Cross sectional transmission electron microscope images show that the oxygen is present as an amorphous oxide.

Solution Properties and Phase Behavior of Ammonium Hexylene Octyl Succinate in Water and Water-Oil System

1970 ◽  
Vol 3 (1) ◽  
Author(s):  
Md. Hamidul Kabir ◽  
Ravshan Makhkamov ◽  
Shaila Kabir
Keyword(s):  
Critical Micelle Concentration ◽  
Phase Behavior ◽  
Liquid Crystalline ◽  
Carbon Number ◽  
Phase Region ◽  
Solution Properties ◽  
Middle Phase ◽  
Two Phase ◽  
Lamellar Liquid Crystal ◽  
Drug Ingredient

The solution properties and phase behavior of ammonium hexylene octyl succinate (HOS) was investigated in water and water-oil system. The critical micelle concentration (CMC) of HOS is lower than that of anionic surfactants having same carbon number in the lipophilic part. The phase diagrams of a water/ HOS system and water/ HOS/ C10EO8/ dodecane system were also constructed. Above critical micelle concentration, the surfactant forms a normal micellar solution (Wm) at a low surfactant concentration whereas a lamellar liquid crystalline phase (La) dominates over a wide region through the formation of a two-phase region (La+W) in the binary system. The lamellar phase is arranged in the form of a biocompatible vesicle which is very significant for the drug delivery system. The surfactant tends to be hydrophilic when it is mixed with C10EO8 and a middle-phase microemulsion (D) is appeared in the water-surfactant-dodecane system where both the water and oil soluble drug ingredient can be incorporated in the form of a dispersion. Hence, mixing can tune the hydrophile-lipophile properties of the surfactant. Key words: Ammonium hexylene octyl succinate, mixed surfactant, lamellar liquid crystal, middle-phase microemulsion. Dhaka Univ. J. Pharm. Sci. Vol.3(1-2) 2004 The full text is of this article is available at the Dhaka Univ. J. Pharm. Sci. website

Investigation of the Effect of Uv-Assisted Oxidation and Nitridation of Hafnium Metal Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Uv Radiation ◽  
Photoelectron Spectroscopy ◽  
Grazing Angle ◽  
X Ray Diffraction ◽  
Metal Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Silicon Interface

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.

scholarly journals Revisiting the Bøggild Intergrowth in Iridescent Labradorite Feldspars: Ordering, Kinetics, and Phase Equilibria

Minerals ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 727
Author(s):  
Shiyun Jin ◽  
Huifang Xu ◽  
Seungyeol Lee
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Atom Probe ◽  
Phase Region ◽  
Two Phase ◽  
Subsolidus Phase ◽  
Plagioclase Feldspar ◽  
X Ray ◽  
Transmission Electron ◽  
Scanning Transmission

The enigmatic Bøggild intergrowth in iridescent labradorite crystals was revisited in light of recent work on the incommensurately modulated structures in the intermediated plagioclase. Five igneous samples and one metamorphic labradorite sample with various compositions and lamellar thicknesses were studied in this paper. The lamellar textures were characterized with conventional transmission electron microscopy (TEM) and scanning transmission electron microscopy (STEM). The compositions of individual lamellae were analyzed with high-resolution energy-dispersive X-ray spectroscopy (EDS) mapping and atom probe tomography (APT). The average structure states of the studied samples were also compared with single-crystal X-ray diffraction data (SC-XRD). The Na-rich lamellae have a composition of An44–48, and the Ca-rich lamellae range from An56 to An63. Significant differences between the lamellar compositions of different samples were observed. The compositions of the Bøggild intergrowth do not only depend on the bulk compositions, but also on the thermal history of the host rock. The implications on the subsolidus phase relationships of the plagioclase feldspar solid solution are discussed. The results cannot be explained by a regular symmetrical solvus such as the Bøggild gap, but they support an inclined two-phase region that closes at low temperature.

scholarly journals Thermodynamics and Machine Learning Based Approaches for Vapor–Liquid–Liquid Phase Equilibria in n-Octane/Water, as a Naphtha–Water Surrogate in Water Blends

Processes ◽  
2021 ◽  
Vol 9 (3) ◽  
pp. 413
Author(s):  
Sandra Lopez-Zamora ◽  
Jeonghoon Kong ◽  
Salvador Escobedo ◽  
Hugo de Lasa
Keyword(s):  
Machine Learning ◽  
Liquid Phase ◽  
Phase Equilibria ◽  
Aspen Plus ◽  
Phase Region ◽  
Two Phase ◽  
Technical Literature ◽  
Phase Liquid ◽  
Liquid Vapor ◽  
Vapor Liquid

The prediction of phase equilibria for hydrocarbon/water blends in separators, is a subject of considerable importance for chemical processes. Despite its relevance, there are still pending questions. Among them, is the prediction of the correct number of phases. While a stability analysis using the Gibbs Free Energy of mixing and the NRTL model, provide a good understanding with calculation issues, when using HYSYS V9 and Aspen Plus V9 software, this shows that significant phase equilibrium uncertainties still exist. To clarify these matters, n-octane and water blends, are good surrogates of naphtha/water mixtures. Runs were developed in a CREC vapor–liquid (VL_ Cell operated with octane–water mixtures under dynamic conditions and used to establish the two-phase (liquid–vapor) and three phase (liquid–liquid–vapor) domains. Results obtained demonstrate that the two phase region (full solubility in the liquid phase) of n-octane in water at 100 °C is in the 10-4 mol fraction range, and it is larger than the 10-5 mol fraction predicted by Aspen Plus and the 10-7 mol fraction reported in the technical literature. Furthermore, and to provide an effective and accurate method for predicting the number of phases, a machine learning (ML) technique was implemented and successfully demonstrated, in the present study.

Phase Equilibrium of Mg-Nd-Zn System near Mg-Nd Side at 400°C

2016 ◽  
Vol 873 ◽  
pp. 18-22
Author(s):  
Ming Li Huang ◽  
Xue Shen ◽  
Hong Xiao Li
Keyword(s):  
Solid Solution ◽  
Phase Equilibrium ◽  
Ternary Isothermal Section ◽  
Phase Region ◽  
X Ray Diffraction ◽  
Maximum Solubility ◽  
Two Phase ◽  
Solubility Range ◽  
Three Phase ◽  
Equilibrium Alloys

The equilibrium alloys closed to Mg-Nd side in the Mg-rich corner of the Mg-Zn-Nd system at 400°C have been investigated by scanning electron microscopy, electron probe microanalysis and X-ray diffraction. The binary solid solutions Mg12Nd and Mg3Nd with the solubility of Zn have been identified. The maximum solubility of Zn in Mg12Nd is 4.8at%, and Mg12Nd phase can be in equilibrium with Mg solid solution. However, only when the solubility range of Zn in 26at%~32.2at%, Mg3Nd can be in two-phase equilibrium with Mg solid solution. As the results, two two-phase regions as Mg+Mg12Nd and Mg+Mg3Nd and a three-phase region as Mg+Mg12Nd+Mg3Nd in Mg-Nd-Zn ternary isothermal section at 400°C have been identified.

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