High Strain Rate Induced Phenomenon in Thin Nickel Films

ASME 2010 8th International Conference on Nanochannels, Microchannels, and Minichannels: Parts A and B ◽

10.1115/fedsm-icnmm2010-30631 ◽

2010 ◽

Author(s):

Hanif Muhammad Khan ◽

Sung-Gaun Kim

Keyword(s):

Thin Films ◽

Strain Rate ◽

Failure Mechanism ◽

Loading Condition ◽

Short Pulse ◽

Ductile Failure ◽

Systems Design ◽

Nickel Films ◽

Thin Nickel ◽

Eam Potential

Molecular dynamics study has been performed to investigate the effect of extreme dynamic loading condition on thin Nickel films. Due to the novel aspects of thin films, it has attracted attention over the years for Nano-electro-mechanical systems design. This would be helpful for the analysis of ultra short pulse laser induced fabrication or machining of thin films. Uniaxial high tensile strain namely 109 and 1010 s−1 has been used on a Nickel thin film. The Embedded-atom method (EAM) potential function for Nickel has been used for the interaction of the atoms. We have observed ductile failure mechanism on both the cases. With the increase of strain rate, not only high strength has been found but also the elastic modulus has been affected less. Random non spherical void growth and their coalescence have been also observed during higher loading condition which leads to a ductile failure mechanism.

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A Study on the Thermodynamics of Grain Growth in R.F. Magnetron Sputtered NiO Thin Films

Journal of Coatings ◽

10.1155/2013/981515 ◽

2013 ◽

Vol 2013 ◽

pp. 1-6 ◽

Cited By ~ 4

Author(s):

I. Dhanya ◽

B. Sasi

Keyword(s):

Thin Films ◽

Interband Transition ◽

Fundamental Absorption Edge ◽

Oxidation Mechanism ◽

Xrd Analysis ◽

Preferential Growth ◽

Nickel Films ◽

Force Microscopy ◽

Atomic Force ◽

Thin Nickel

Postdeposition annealing of thin nickel films synthesized using R.F. magnetron sputtering technique is carried in this study. The XRD analysis indicates that annealing of the nickel films leads to the formation of nickel oxide with a preferential growth along (200) plane. The oxidation mechanism is observed with a phase transformation and results in polycrystalline NiO films. The surface morphology of the thin films was investigated by scanning electron microscopy (SEM) and atomic force microscopy (AFM) as a function of annealing temperature. The studies indicate the formation of well-defined grain boundaries due to agglomeration of nanocrystallites. The films annealed in the range 573–773 K are found to be porous. The optical transmission spectra of the films annealed at 773 K exhibit interference effects for photon energies below the fundamental absorption edge. The optical studies indicate the existence of direct interband transition across a bandgap of 3.7 eV in confirmation with earlier band structure calculations.

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Microstructure evolution of thin nickel films with embedded chromium oxide nanoparticles

Acta Materialia ◽

10.1016/j.actamat.2020.10.032 ◽

2020 ◽

Vol 201 ◽

pp. 561-571

Author(s):

Hagit Barda ◽

Leonid Klinger ◽

Eugen Rabkin

Keyword(s):

Chromium Oxide ◽

Microstructure Evolution ◽

Oxide Nanoparticles ◽

Nickel Films ◽

Thin Nickel ◽

Chromium Oxide Nanoparticles

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The Study on Young's Modulus of Multilayered Cu/Ni Multilayered Nano Thin Films by Molecular Dynamics Simulation

Applied Mechanics and Materials ◽

10.4028/www.scientific.net/amm.513-517.113 ◽

2014 ◽

Vol 513-517 ◽

pp. 113-116

Author(s):

Jen Ching Huang ◽

Fu Jen Cheng ◽

Chun Song Yang

Keyword(s):

Thin Film ◽

Thin Films ◽

Molecular Dynamics ◽

Molecular Dynamics Simulation ◽

Strain Rate ◽

Young’S Modulus ◽

Potential Function ◽

Dynamics Simulation ◽

System Temperature ◽

Simulation Results

The Youngs modulus of multilayered nanothin films is an important property. This paper focused to investigate the Youngs Modulus of Multilayered Ni/Cu Multilayered nanoThin Films under different condition by Molecular Dynamics Simulation. The NVT ensemble and COMPASS potential function were employed in the simulation. The multilayered nanothin film contained the Ni and Cu thin films in sequence. From simulation results, it is found that the Youngs modulus of Cu/Ni multilayered nanothin film is different at different lattice orientations, temperatures and strain rate. After experiments, it can be found that the Youngs modulus of multilayered nanothin film in the plane (100) is highest. As thickness of the thin film and system temperature rises, Youngs modulus of multilayered nanothin film is reduced instead. And, the strain rate increases, the Youngs modulus of Cu/Ni multilayered nanothin film will also increase.

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A Newly Developed Clamping Device for the Tension/Compression Test at Various Strain Rates

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.626.353 ◽

2014 ◽

Vol 626 ◽

pp. 353-358

Author(s):

Geun Su Joo ◽

Min Kuk Choi ◽

Hoon Huh

Keyword(s):

Strain Rate ◽

Sheet Metal ◽

Metal Forming ◽

Loading Condition ◽

Strain Rates ◽

Compression Tests ◽

Compression Behavior ◽

Compression Loading ◽

Hardening Behavior ◽

Clamping Device

The tension/compression hardening behavior is important in sheet metal forming processes because of complicated loading paths. Experimental methods to measure the tension/ compression behavior have not considered the effect of the strain rate although the strain rate is related to the hardening behavior of sheet metal. The tension/compression tests need to be conducted considering the strain rate to acquire accurate hardening behavior.This paper deals with an experimental technique to measure the tension/compression behavior of sheet metal at various strain rates. A new clamping device was developed to prevent a sheet specimen from buckling under compression loading condition. Compared to previous clamping devices, the clamping device was devised to uniformly impose a clamping force and easily measure the strain from side of a specimen. Tension/compression tests have been conducted at various strain rates for SPCC and DP590 with displacement of 10%. Hardening curves under the tension or compression loading condition were obtained and analyzed with respect to the strain rate.

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