Process development of methane–hydrogen–argon-based deep dry etching of InP for high aspect-ratio structures with vertical facet-quality sidewalls

2001 ◽  
Vol 19 (5) ◽  
pp. 1694 ◽  
Author(s):  
Rohit Grover ◽  
John Vetold Hryniewicz ◽  
Oliver Simon King ◽  
Vien Van
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Process Development ◽  
Dry Etching

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

2017 ◽  
Vol 180 ◽  
pp. 20-24 ◽  
Author(s):  
Y. Lisunova ◽  
M. Spieser ◽  
R.D.D. Juttin ◽  
F. Holzner ◽  
J. Brugger
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching ◽  
Scanning Probe ◽  
Scanning Probe Lithography

Dry Etching of High Aspect Ratio 4H-SiC Microstructures

2017 ◽  
Vol 6 (4) ◽  
pp. P207-P210 ◽  
Author(s):  
Lunet E. Luna ◽  
Marko J. Tadjer ◽  
Travis J. Anderson ◽  
Eugene A. Imhoff ◽  
Karl D. Hobart ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching
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