Characteristics of TaSi[sub x]N[sub y] thin films as gate electrodes for dual gate Si-complementary metal-oxide-semiconductor devices
2004 ◽
Vol 22
(1)
◽
pp. 175
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2000 ◽
Vol 39
(Part 1, No. 4B)
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pp. 2167-2171
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2009 ◽
Vol 27
(3)
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pp. 1261
2011 ◽
Vol 32
(7)
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pp. 076001
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2000 ◽
Vol 39
(Part 1, No. 12B)
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pp. 6843-6848
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2008 ◽
Vol 26
(4)
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pp. 1440
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