Application of ion beam etching technique to the direct fabrication of silicon microtip arrays

Author(s):  
Xinyu Zhang ◽  
Qingle Tang ◽  
Junming Tang
2015 ◽  
Vol 5 (7) ◽  
pp. 1647 ◽  
Author(s):  
A. L. Chekhov ◽  
V. L. Krutyanskiy ◽  
V. A. Ketsko ◽  
A. I. Stognij ◽  
T. V. Murzina

1989 ◽  
Vol 169 ◽  
Author(s):  
Shin'ichi Morohashi ◽  
Hideo Suzuki ◽  
Kohtaroh Gotoh ◽  
Norio Fujimaki ◽  
Shinya Hasuo

AbstractWe fabricated the multi layered structure with Au gate electrode/polymer film/Bi-Sr-Ca-Cu-O film to study the electric-field control of high Tc superconductor. A Bi-Sr-Ca-Cu-O(BSCCO) film was fabricated using an ion beam sputtering technique. The plasma polymerization using trif luoroethane gas was used to make the gate insulator. The patterning of the BSCCO film was carried out using an ion beam etching technique. The supercurrent of the structure decreased when the gate voltage was applied to the gate electrode.


2006 ◽  
Vol 499 (1-2) ◽  
pp. 279-284 ◽  
Author(s):  
Takashi Nagase ◽  
Kenji Gamo ◽  
Tohru Kubota ◽  
Shinro Mashiko

1987 ◽  
Vol 51 (22) ◽  
pp. 1774-1776 ◽  
Author(s):  
Akihiko Kasukawa ◽  
Masayuki Iwase ◽  
Yuji Hiratani ◽  
Narihito Matsumoto ◽  
Yoshikazu Ikegami ◽  
...  

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