200-mm-diameter neutral beam source based on inductively coupled plasma etcher and silicon etching

2010 ◽  
Vol 28 (5) ◽  
pp. 1169-1174 ◽  
Author(s):  
Tomohiro Kubota ◽  
Osamu Nukaga ◽  
Shinji Ueki ◽  
Masakazu Sugiyama ◽  
Yoshimasa Inamoto ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Neutral Beam ◽  
Silicon Etching ◽  
Beam Source ◽  
Inductively Coupled

scholarly journals High Throughput Sample Preparation and Analysis Using an Inductively Coupled Plasma (ICP) Focused Ion Beam Source

2010 ◽  
Vol 16 (S2) ◽  
pp. 222-223 ◽  
Author(s):  
S Kellogg ◽  
R Schampers ◽  
S Zhang ◽  
A Graupera ◽  
T Miller ◽  
...  
Keyword(s):  
Sample Preparation ◽  
High Throughput ◽  
Inductively Coupled Plasma ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Beam Source ◽  
Inductively Coupled

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Direct Graphene Synthesis on Si(100) by Inductively Coupled Plasma Beam Source

2021 ◽  
pp. 152265
Author(s):  
Š. Meškinis ◽  
A. Vasiliauskas ◽  
R. Gudaitis ◽  
M. Andrulevičius ◽  
A. Guobienė
Keyword(s):  
Inductively Coupled Plasma ◽  
Beam Source ◽  
Plasma Beam ◽  
Inductively Coupled ◽  
Graphene Synthesis
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