Direct-write electron beam lithography in silicon dioxide at low energy
2010 ◽
Vol 28
(5)
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pp. 940-945
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Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies.
1996 ◽
Vol 9
(4)
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pp. 663-675
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Keyword(s):
2000 ◽
Vol 18
(2)
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pp. 681-684
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Keyword(s):
Keyword(s):
2001 ◽
Vol 57-58
◽
pp. 297-302
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Keyword(s):