Experimental study of electron cyclotron resonance reactive ion beam etching of W and Mo thin film

Ion Beam ◽

Electron Cyclotron ◽

Ion Beam Etching ◽

A 26‐cm electron‐cyclotron‐resonance ion source for reactive ion beam etching of SiO2 and Si

Journal of Vacuum Science and Technology ◽

10.1116/1.571659 ◽

1982 ◽

Vol 20 (4) ◽

pp. 986-988 ◽

Cited By ~ 28

Author(s):

M. Miyamura ◽

O. Tsukakoshi ◽

S. Komiya

Keyword(s):

Cyclotron Resonance ◽

Ion Beam ◽

Ion Source ◽

Electron Cyclotron ◽

Ion Beam Etching ◽

Reactive Ion Beam Etching of Indium Phosphide in Electron Cyclotron Resonance Plasma Using Methane/Hydrogen/Nitrogen Mixtures

10.1143/jjap.33.l390 ◽

1994 ◽

Vol 33 (Part 2, No. 3A) ◽

pp. L390-L393 ◽

Cited By ~ 21

Author(s):

José Ramón Sendra ◽

José Anguita

Keyword(s):

Indium Phosphide ◽

Cyclotron Resonance ◽

Ion Beam ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Ion Beam Etching ◽

Resonance Plasma ◽

Optimization of Electron Cyclotron Resonance Reactive Ion Beam Etching Reactors for Dry Etching of GaAs with Cl2

Journal of The Electrochemical Society ◽

10.1149/1.1837982 ◽

1997 ◽

Vol 144 (9) ◽

pp. 3191-3197 ◽

Cited By ~ 3

Author(s):

K. Nishioka ◽

M. Sugiyama ◽

M. Nezuka ◽

Y Shimogaki ◽

Y. Nakano ◽

...

Keyword(s):

Cyclotron Resonance ◽

Ion Beam ◽

Dry Etching ◽

Electron Cyclotron ◽

Ion Beam Etching ◽

Electron Cyclotron Resonance-Reactive Ion Beam Etching of InP by Cyclic Injection of CH4/H2/Ar and O2

10.1143/jjap.41.15 ◽

2002 ◽

Vol 41 (Part 1, No. 1) ◽

pp. 15-19 ◽

Cited By ~ 16

Author(s):

Tatsuya Suzuki ◽

Nobuo Haneji ◽

Kunio Tada ◽

Yukihiro Shimogaki ◽

Yoshiaki Nakano

Keyword(s):

Cyclotron Resonance ◽

Ion Beam ◽

Electron Cyclotron ◽

Ion Beam Etching ◽

Cyclic Injection ◽

Reactive Ion-Beam Etching and Plasma Deposition Techniques Using Electron Cyclotron Resonance Plasmas

Silicon Integrated Circuits ◽

10.1016/b978-0-12-002960-0.50007-8 ◽

1985 ◽

pp. 75-117

Author(s):

SEITARO MATSUO

Keyword(s):

Cyclotron Resonance ◽

Plasma Deposition ◽

Ion Beam ◽

Electron Cyclotron ◽

Ion Beam Etching ◽

Deposition Techniques ◽

A simple kinetic model for the optimization of electron cyclotron resonance/reactive ion beam etching performance for GaAs

Applied Physics Letters ◽

10.1063/1.114729 ◽

1995 ◽

Vol 67 (7) ◽

pp. 897-899 ◽

Cited By ~ 1

Author(s):

Masakazu Sugiyama ◽

Takayuki Yamaizumi ◽

Masahiro Nezuka ◽

Yukihiro Shimogaki ◽

Yoshiaki Nanako ◽

...

Keyword(s):

Kinetic Model ◽

Cyclotron Resonance ◽

Ion Beam ◽

Electron Cyclotron ◽

Ion Beam Etching ◽

Simple Kinetic Model ◽

Fabrication of GaInAs/GaInAsP/InP Multi-Quantum-Wires and -Boxes by Substrate-Potential-Controlled Electron Cyclotron Resonance Reactive Ion Beam Etching

10.1143/jjap.33.l1382 ◽

1994 ◽

Vol 33 (Part 2, No. 10A) ◽

pp. L1382-L1385 ◽

Cited By ~ 6

Author(s):

Koji Kudo ◽

Yasuaki Nagashima ◽

Munehisa Tamura ◽

Shigeo Tamura ◽

Akinori Ubukata ◽

...

Keyword(s):

Cyclotron Resonance ◽

Quantum Wires ◽

Ion Beam ◽

Electron Cyclotron ◽

Ion Beam Etching ◽

Substrate Potential ◽

Estimation of Sidewall Nonradiative Recombination in GaInAsP/InP Wire Structures Fabricated by Low Energy Electron-Cyclotron-Resonance Reactive-Ion-Beam-Etching

10.1143/jjap.37.3576 ◽

1998 ◽

Vol 37 (Part 1, No. 6A) ◽

pp. 3576-3584 ◽

Cited By ~ 19

Author(s):

Suguru Tabara

Keyword(s):

Cyclotron Resonance ◽

Ion Beam ◽

Electron Cyclotron ◽

Low Energy ◽

Energy Electron ◽

Nonradiative Recombination ◽

Ion Beam Etching ◽

Low Energy Electron ◽

IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science ◽

Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

10.1109/plasma.1997.604953 ◽

2002 ◽

Author(s):

E. Koretzky ◽

S.P. Kuo ◽

S.C. Kuo

Keyword(s):

Thin Film ◽

Experimental Study ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Plasma

Photoelectron Spectroscopy of $\bf EuBa_{2}Cu_{3}O_{{7}-{\ninmbi y}}$ Thin Film Surfaces Treated by an Electron Cyclotron Resonance Oxygen Ion Beam

10.1143/jjap.34.l433 ◽

1995 ◽

Vol 34 (Part 2, No. 4A) ◽

pp. L433-L436

Author(s):

Hidefumi Asano ◽

Minoru Suzuki ◽

Takanori Kiyokura ◽

Fumihiko Maeda ◽

Andreas Menz ◽

...

Keyword(s):

Thin Film ◽

Photoelectron Spectroscopy ◽

Cyclotron Resonance ◽

Ion Beam ◽

Electron Cyclotron ◽

Oxygen Ion