X‐ray and vacuum ultraviolet imaging for electron cyclotron resonance processing plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578491 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1186-1192 ◽

Author(s):

K. H. Chew ◽

J. L. Shohet ◽

T. J. Castagna ◽

K. L. Seaward ◽

F. F. Mertz

Keyword(s):

Cyclotron Resonance ◽

Vacuum Ultraviolet ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

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X-ray photoelectron diffraction observation of β-SiC(001) obtained by electron cyclotron resonance plasma assisted growth on Si(001)

Applied Surface Science ◽

10.1016/0169-4332(93)90239-8 ◽

1993 ◽

Vol 68 (4) ◽

pp. 575-582 ◽

Author(s):

M. Diani ◽

J.L. Bischoff ◽

L. Kubler ◽

D. Bolmont

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Photoelectron Diffraction ◽

Resonance Plasma

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Vacuum ultraviolet radiation damage in electron cyclotron resonance and reactive ion etch plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577365 ◽

1991 ◽

Vol 9 (3) ◽

pp. 804-809 ◽

Author(s):

D. A. Buchanan ◽

G. Fortuño‐Wiltshire

Keyword(s):

Ultraviolet Radiation ◽

Radiation Damage ◽

Cyclotron Resonance ◽

Vacuum Ultraviolet ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Vacuum Ultraviolet Radiation

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Study of gasdynamic electron cyclotron resonance plasma vacuum ultraviolet emission to optimize negative hydrogen ion production efficiency

Review of Scientific Instruments ◽

10.1063/1.5128313 ◽

2020 ◽

Vol 91 (1) ◽

pp. 013517 ◽

Author(s):

R. L. Lapin ◽

V. A. Skalyga ◽

I. Izotov ◽

S. V. Razin ◽

R. A. Shaposhnikov ◽

...

Keyword(s):

Cyclotron Resonance ◽

Production Efficiency ◽

Vacuum Ultraviolet ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Hydrogen Ion ◽

Ultraviolet Emission ◽

Electron Cyclotron Resonance Plasma ◽

Ion Production ◽

Resonance Plasma

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Experimental studies on a compact electron cyclotron resonance plasma x-ray source

Review of Scientific Instruments ◽

10.1063/1.1149821 ◽

1999 ◽

Vol 70 (6) ◽

pp. 2637-2645 ◽

Author(s):

R. Baskaran ◽

T. S. Selvakumaran

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Experimental Studies ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Resonance Plasma

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X‐ray photoemission and Raman scattering spectroscopic study of surface modifications of silicon induced by electron cyclotron resonance etching

Applied Physics Letters ◽

10.1063/1.103607 ◽

1990 ◽

Vol 57 (6) ◽

pp. 590-592 ◽

Author(s):

A. S. Yapsir ◽

G. S. Oehrlein ◽

G. Fortuño‐Wiltshire ◽

J. C. Tsang

Keyword(s):

Raman Scattering ◽

Spectroscopic Study ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Surface Modifications ◽

Electron Cyclotron ◽

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SiC x-ray lithography mask fabricated by electron cyclotron resonance plasma source coupled with divided microwaves

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589378 ◽

1997 ◽

Vol 15 (3) ◽

pp. 736 ◽

Author(s):

Masaru Shimada

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Resonance Plasma

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Measurement of ion charge state distributions inside electron cyclotron resonance neon and chlorine plasmas by x-ray spectroscopy (abstract)

Review of Scientific Instruments ◽

10.1063/1.1149228 ◽

1998 ◽

Vol 69 (2) ◽

pp. 1203-1203

Author(s):

P. Grübling ◽

D. Küchler ◽

A. Ullrich ◽

T. Werner ◽

G. Zschornack

Keyword(s):

Charge State ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

X Ray ◽

Charge State Distributions

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Maximum x-ray energy from compact electron cyclotron resonance based source of x rays

Review of Scientific Instruments ◽

10.1063/1.1480456 ◽

2002 ◽

Vol 73 (6) ◽

pp. 2287-2291 ◽

Author(s):

C. Rouillé ◽

K. Serebrennikov ◽

M. Bacal

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

X Rays ◽

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Ultrahigh-Vacuum Electron Cyclotron Resonance-Plasma Chemical-Vapor-DepositedSiNxFilms for X-Ray Lithography Mask Membrane: As-Deposited Properties and Radiation Stability

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.6908 ◽

1994 ◽

Vol 33 (Part 1, No. 12B) ◽

pp. 6908-6912 ◽

Author(s):

Jinho Ahn ◽

Katsumi Suzuki ◽

Shinji Tsuboi ◽

Yoshio Yamashita

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Radiation Stability ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Resonance Plasma

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Pulse height analysis using Si-pin diode of x-ray irradiated from a 2.45 GHz electron cyclotron resonance multicharged ion source

Review of Scientific Instruments ◽

10.1063/1.1148659 ◽

1998 ◽

Vol 69 (2) ◽

pp. 1179-1181 ◽

Author(s):

Yushi Kato ◽

Yoshiyuki Kubo ◽

Shigeyuki Ishii

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Pulse Height ◽

Electron Cyclotron ◽

Pin Diode ◽

X Ray ◽

Pulse Height Analysis

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