scholarly journals Pull‐test adhesion measurements of diamondlike carbon films on silicon carbide, silicon nitride, aluminum oxide, and zirconium oxide

1994 ◽  
Vol 12 (4) ◽  
pp. 1583-1586 ◽  
Author(s):  
R. A. Erck ◽  
F. A. Nichols ◽  
J. F. Dierks
Keyword(s):  
Silicon Carbide ◽  
Silicon Nitride ◽  
Aluminum Oxide ◽  
Zirconium Oxide ◽  
Carbon Films ◽  
Pull Test ◽  
Diamondlike Carbon

Tribological Properties of Ceramics, Cermets, and Cemented Carbides

2021 ◽  
pp. 271-300
Keyword(s):  
Silicon Carbide ◽  
Silicon Nitride ◽  
Aluminum Oxide ◽  
Tribological Properties ◽  
Friction And Wear ◽  
Cemented Carbides

Abstract This chapter concerns itself with the tribology of ceramics, cermets, and cemented carbides. It begins by describing the composition and friction and wear behaviors of aluminum oxide, silicon carbide, silicon nitride, and zirconia. It then compares and contrasts the microstructure, properties, and relative merits of cermets with those of cemented carbides.

Whisker Toughening: A Comparison Between Aluminum Oxide and Silicon Nitride Toughened with Silicon Carbide

1990 ◽  
Vol 73 (3) ◽  
pp. 521-530 ◽  
Author(s):  
Geoffrey H. Campbell ◽  
Manfred Ruhle ◽  
Brian J. Dalgleish ◽  
Anthony G. Evans
Keyword(s):  
Silicon Carbide ◽  
Silicon Nitride ◽  
Aluminum Oxide

Using Molecular-Beam Mass Spectrometry to Study the Pecvd of Diamondlike Carbon Films

1993 ◽  
Vol 334 ◽  
Author(s):  
I.B. Graff ◽  
R.A. Pugliese ◽  
P.R. Westmoreland
Keyword(s):  
Mass Spectrometry ◽  
Vapor Deposition ◽  
Molecular Beam ◽  
Film Growth ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Total Flow ◽  
Measured Concentration ◽  
Molecular Beam Mass Spectrometry ◽  
Diamondlike Carbon

AbstractMolecular-beam mass spectrometry has been used to study plasma-enhanced chemical vapor deposition (PECVD) of diamondlike carbon films. A threshold-ionization technique was used to identify and quantify species in the plasma. Mole fractions of H, H2, CH4, C2H2, C2H6 and Ar were measured in an 83.3% CH4/Ar mixture at a pressure of 0.1 torr and a total flow of 30 sccm. Comparisons were made between mole fractions measured at plasma powers of 25W and 50W. These results were compared to measured concentration profiles and to film growth rates.

Superior wear resistance and low friction in hybrid ultrathin silicon nitride/carbon films: synergy of the interfacial chemistry and carbon microstructure

Nanoscale ◽  
2017 ◽  
Vol 9 (39) ◽  
pp. 14937-14951 ◽  
Author(s):  
Reuben J. Yeo ◽  
Neeraj Dwivedi ◽  
Lu Zhang ◽  
Zheng Zhang ◽  
Christina Y. H. Lim ◽  
...  
Keyword(s):  
Wear Resistance ◽  
Silicon Nitride ◽  
Carbon Films ◽  
Interfacial Chemistry ◽  
Low Friction

A sub-10 nm hybrid SiNx/C film demonstrated remarkable wear durability under aggressive wear due to an enhanced interfacial chemistry and carbon microstructure.

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