Atomic force microscope study of amorphous silicon and polysilicon low-pressure chemical-vapor-deposited implanted layers

2000 ◽  
Vol 18 (1) ◽  
pp. 41 ◽  
Author(s):  
R. Edrei ◽  
E. N. Shauly ◽  
A. Hoffman
Keyword(s):  
Atomic Force Microscope ◽  
Amorphous Silicon ◽  
Microscope Study ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Atomic Force ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Characterization of hydrogenation and dehydrogenation of post‐plasma treated low‐pressure chemical‐vapor‐deposited amorphous silicon films

1987 ◽  
Vol 62 (9) ◽  
pp. 3740-3746 ◽  
Author(s):  
Minoru Nakamura ◽  
Toshiyuki Ohno ◽  
Nobutake Konishi ◽  
Kenji Miyata ◽  
Norimasa Kamezawa
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical
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