Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution
2021 ◽
Vol 39
(6)
◽
pp. 064005
1994 ◽
Vol 27
(1)
◽
pp. 61-68
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2003 ◽
Vol 13
(10)
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pp. 635-639
Keyword(s):
2000 ◽
Vol 74
(1-3)
◽
pp. 40-44
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2009 ◽
Vol 9
(1)
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pp. S82-S84
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2017 ◽
Vol 50
(20)
◽
pp. 204001
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Keyword(s):
1982 ◽
Vol 40
◽
pp. 664-665
1971 ◽
Vol 32
(C5)
◽
pp. C5a-295-C5a-300