Atomic force microscopy study of photoresist sidewall smoothing and line edge roughness transfer during gate patterning

2013 ◽  
Vol 12 (4) ◽  
pp. 041308 ◽  
Author(s):  
Marc Fouchier ◽  
Erwine Pargon
2003 ◽  
Vol 36 (25) ◽  
pp. 9510-9518 ◽  
Author(s):  
Marc Schneider ◽  
Martin Brinkmann ◽  
Helmuth Möhwald

2006 ◽  
Vol 114 (s1) ◽  
pp. 99-104 ◽  
Author(s):  
Colin Robinson ◽  
Kyoko Yamamoto ◽  
Simon D. Connell ◽  
Jennifer Kirkham ◽  
Haruo Nakagaki ◽  
...  

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