Vanadium nitride-based ultra-wideband nearly perfect metamaterial absorber

2021 ◽  
Vol 15 (03) ◽  
Author(s):  
Essam M. Sheta ◽  
Pankaj K. Choudhury
2012 ◽  
Vol 1 (3) ◽  
pp. 7 ◽  
Author(s):  
F. Costa ◽  
A. Monorchio

Different electrically-thin absorbing designs based on  High-Impedance Surfaces (HIS) are presented and classified on the basis of the nature of loss. HIS structures allow achieving absorption by exploiting either dielectric or ohmic (resistive) losses. The former ultra-narrowband absorption phenomenon can be obtained by employing dielectric losses of commercial substrates. The resonant structure, often referred to as Perfect Metamaterial Absorber, usually comprises a metallic frequency selective surfaces located above a ultra-thin grounded dielectric substrate. The metamaterial absorber is also angularly stable because of its reduced thickness. Alternatively, if a loss component is introduced in the frequency selective surface located in front of the grounded dielectric substrate both narrowband and wideband absorbing structures can be designed.


2021 ◽  
Vol 23 ◽  
pp. 104037
Author(s):  
Miao Pan ◽  
Huazhu Huang ◽  
Baodian Fan ◽  
Wenzhi Chen ◽  
Shuai Li ◽  
...  

Nanophotonics ◽  
2021 ◽  
Vol 10 (4) ◽  
pp. 1337-1346
Author(s):  
Jin Tao ◽  
Zhongzhu Liang ◽  
Guang Zeng ◽  
Dejia Meng ◽  
David R. Smith ◽  
...  

Abstract Cointegration and coupling a perfect metamaterial absorber (PMA) together with a film bulk acoustic wave resonator (FBAR) in a monolithic fashion is introduced for the purpose of producing ultracompact uncooled infrared sensors of high sensitivity. An optimized ultrathin multilayer stack was implemented to realize the proposed device. It is experimentally demonstrated that the resonance frequency of the FBAR can be used efficiently as a sensor output as it downshifts linearly with the intensity of the incident infrared irradiation. The resulting sensor also achieves a high absorption of 88% for an infrared spectrum centered at a wavelength of 8.2 μm. The structure is compact and can be easily integrated on a CMOS-compatible chip since both the FBAR and PMA utilize and share the same stack of metal and dielectric layers.


2016 ◽  
Vol 24 (2) ◽  
pp. 1518 ◽  
Author(s):  
Gang Yao ◽  
Furi Ling ◽  
Jin Yue ◽  
Chunya Luo ◽  
Jie Ji ◽  
...  

2017 ◽  
Vol 50 (38) ◽  
pp. 385304 ◽  
Author(s):  
Xiaojun Huang ◽  
Helin Yang ◽  
Zhaoyang Shen ◽  
Jiao Chen ◽  
Hail Lin ◽  
...  

Materials ◽  
2018 ◽  
Vol 11 (12) ◽  
pp. 2590 ◽  
Author(s):  
Huafeng Liu ◽  
Kai Luo ◽  
Shihao Tang ◽  
Danhua Peng ◽  
Fangjing Hu ◽  
...  

Metamaterial-based absorbers have been extensively investigated in the terahertz (THz) range with ever increasing performances. In this paper, we propose an all-dielectric THz absorber based on doped silicon. The unit cell consists of a silicon cross resonator with an internal cross-shaped air cavity. Numerical results suggest that the proposed absorber can operate from THz to far-infrared regimes, having an average power absorption of ∼95% between 0.6 and 10 THz. Experimental results using THz time-domain spectroscopy show a good agreement with simulations. The underlying mechanisms for broadband absorption are attributed to the combined effects of multiple cavities modes formed by silicon resonators and bulk absorption in the doped silicon substrate, as confirmed by simulated field patterns and calculated diffraction efficiency. This ultra-wideband absorption is polarization insensitive and can operate across a wide range of the incident angle. The proposed absorber can be readily integrated into silicon-based photonic platforms and used for sensing, imaging, energy harvesting and wireless communications applications in the THz/IR range.


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